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[Search a list of Patent Appplications for class 522]  Class   522SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES
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This Class 522 is considered to be an integral part of Class 520 (see the Class 520 schedule for the position of this Class in schedule hierarchy). This Class retains all pertinent definitions and class lines of Class 520
              SYNTHETIC RESINS (CLASS 520, SUBCLASS 1)
[List of Patents for class 522 subclass 1]  1           Subclass 1 indent level is 1 COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY
[List of Patents for class 522 subclass 2]  2           Subclass 2 indent level is 2 Processes of forming or modifying a solid polymer by laser; or compositions therefore
[List of Patents for class 522 subclass 3]  3           Subclass 3 indent level is 2 Processes of forming or modifying a solid polymer wherein specified mixing, stirring, agitating, movement of material or directional orientation is employed; or compositions therefore
[List of Patents for class 522 subclass 4]  4           Subclass 4 indent level is 2 Processes of forming or modifying a solid polymer by wave energy wherein at least two distinct external radiant energy sources are utilized; or compositions therefore
[List of Patents for class 522 subclass 5]  5           Subclass 5 indent level is 2 Processes of forming or modifying a solid polymer by wave energy wherein a temperature less than 0 degree C (32 degree F) or greater than 250 degree C (482 degree F) is employed; or compositions therefore
[List of Patents for class 522 subclass 6]  6           Subclass 6 indent level is 2 Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of at least one specified rate-affecting material; e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc. wave energy in order to prepare a cellular product
[List of Patents for class 522 subclass 7]  7           Subclass 7 indent level is 3 Contains two or more rate-affecting materials, at least one of which is specified
[List of Patents for class 522 subclass 8]  8           Subclass 8 indent level is 4 At least two specified rate-affecting materials containing keto group not part of a ring; or contains a nonspecified photoinitiator or photosensitizer and specified ketone containing material wherein the keto group is not part of a ring
[List of Patents for class 522 subclass 9]  9           Subclass 9 indent level is 5 With a heterocyclic specified rate-affecting material
[List of Patents for class 522 subclass 10]  10           Subclass 10 indent level is 5 With a tertiary amine specified rate-affecting material
[List of Patents for class 522 subclass 11]  11           Subclass 11 indent level is 4 Contains compound containing keto group not part of a ring and nonspecified rate-affecting material other than mere photoinitiator or photosensitizer
[List of Patents for class 522 subclass 12]  12           Subclass 12 indent level is 4 Contains compound containing keto group not part of a ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer
[List of Patents for class 522 subclass 13]  13           Subclass 13 indent level is 5 Specified rate-affecting material is a peroxide or azo compound
[List of Patents for class 522 subclass 14]  14           Subclass 14 indent level is 5 Specified rate-affecting material is an amide or tertiary amine
[List of Patents for class 522 subclass 15]  15           Subclass 15 indent level is 5 Specified rate-affecting material contains onium group
[List of Patents for class 522 subclass 16]  16           Subclass 16 indent level is 5 Specified rate-affecting material is heterocyclic
[List of Patents for class 522 subclass 17]  17           Subclass 17 indent level is 5 Specified rate-affecting material contains sulfur
[List of Patents for class 522 subclass 18]  18           Subclass 18 indent level is 5 Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen atom
[List of Patents for class 522 subclass 19]  19           Subclass 19 indent level is 5 Specified rate-affecting material is an aldehyde or aldehyde derivative
[List of Patents for class 522 subclass 20]  20           Subclass 20 indent level is 5 Specified rate-affecting material is a carboxylic acid or derivative
[List of Patents for class 522 subclass 21]  21           Subclass 21 indent level is 5 Specified rate-affecting material contains C-OH or C-O-C group
[List of Patents for class 522 subclass 22]  22           Subclass 22 indent level is 5 Specified rate-affecting material contains an inorganic compound
[List of Patents for class 522 subclass 23]  23           Subclass 23 indent level is 5 Specified rate-affecting material contains only carbon, hydrogen, or halogen and at least one atom of carbon is bonded to hydrogen or a halogen atom
[List of Patents for class 522 subclass 24]  24           Subclass 24 indent level is 4 Specified rate-affecting material is a peroxide
[List of Patents for class 522 subclass 25]  25           Subclass 25 indent level is 4 Specified rate-affecting material contains onium group
[List of Patents for class 522 subclass 26]  26           Subclass 26 indent level is 4 Specified rate-affecting material is heterocyclic
[List of Patents for class 522 subclass 27]  27           Subclass 27 indent level is 4 Specified rate-affecting material contains sulfur
[List of Patents for class 522 subclass 28]  28           Subclass 28 indent level is 4 Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen
[List of Patents for class 522 subclass 29]  29           Subclass 29 indent level is 4 Specified rate-affecting material is a metal-containing organic compound
[List of Patents for class 522 subclass 30]  30           Subclass 30 indent level is 4 Specified rate-affecting material is organic
[List of Patents for class 522 subclass 31]  31           Subclass 31 indent level is 3 Specified rate-affecting material contains onium group
[List of Patents for class 522 subclass 32]  32           Subclass 32 indent level is 4 Diazonium containing material
[List of Patents for class 522 subclass 33]  33           Subclass 33 indent level is 3 Specified rate-affecting material contains a ketone group -c-(CO)n-c-, the (CO)n not being part of a ring
[List of Patents for class 522 subclass 34]  34           Subclass 34 indent level is 4 Containing ethylenic unsaturation
[List of Patents for class 522 subclass 35]  35           Subclass 35 indent level is 4 Contained in polymeric rate-affecting material, e.g., synthetic resin, etc.
[List of Patents for class 522 subclass 36]  36           Subclass 36 indent level is 4 Containing two or more ketone groups
[List of Patents for class 522 subclass 37]  37           Subclass 37 indent level is 5 Adjacent (C=O)* groups where * is at least two
[List of Patents for class 522 subclass 38]  38           Subclass 38 indent level is 4 Containing phosphorous
[List of Patents for class 522 subclass 39]  39           Subclass 39 indent level is 4 Containing nitrogen
[List of Patents for class 522 subclass 40]  40           Subclass 40 indent level is 4 Containing C-CO-CHOH, e.g., benzoin, etc.
[List of Patents for class 522 subclass 41]  41           Subclass 41 indent level is 5 Containing C-CO-CHOH-CHOR wherein R is organic
[List of Patents for class 522 subclass 42]  42           Subclass 42 indent level is 4 Containing C-CO-C(R)(OH) wherein R is organic
[List of Patents for class 522 subclass 43]  43           Subclass 43 indent level is 4 Containing C-CO-C(H)(OR) wherein R is organic, e.g., benzoin methyl ether, etc.
[List of Patents for class 522 subclass 44]  44           Subclass 44 indent level is 4 Containing C-CO-C(R)(OR) wherein R is organic, e.g., diethoxyacetophenone, etc.
[List of Patents for class 522 subclass 45]  45           Subclass 45 indent level is 4 Containing halogen, e.g., chloroacetone, etc.
[List of Patents for class 522 subclass 46]  46           Subclass 46 indent level is 4 At least two aryl groups connected directly to same carbonyl carbon, e.g., benzophenone, etc.
[List of Patents for class 522 subclass 47]  47           Subclass 47 indent level is 3 Specified rate-affecting material is a quinone
[List of Patents for class 522 subclass 48]  48           Subclass 48 indent level is 4 Quinone ring is part of polynuclear system, e.g., anthraquinone, etc.
[List of Patents for class 522 subclass 49]  49           Subclass 49 indent level is 3 Specified rate-affecting material contains chalcogen other than as oxygen
[List of Patents for class 522 subclass 50]  50           Subclass 50 indent level is 4 Hetero nitrogen ring
[List of Patents for class 522 subclass 51]  51           Subclass 51 indent level is 5 Containing mercapto or mercaptide group, e.g., (thio)mercaptobenzoxazole, etc.
[List of Patents for class 522 subclass 52]  52           Subclass 52 indent level is 5 Containing halogen
[List of Patents for class 522 subclass 53]  53           Subclass 53 indent level is 4 Hetero sulfur ring
[List of Patents for class 522 subclass 54]  54           Subclass 54 indent level is 4 C-(S)*-C wherein * is at least two
[List of Patents for class 522 subclass 55]  55           Subclass 55 indent level is 4 Sulfide
[List of Patents for class 522 subclass 56]  56           Subclass 56 indent level is 4 Mercapto group attached directly to aromatic ring, e.g., thiophenol, etc.
[List of Patents for class 522 subclass 57]  57           Subclass 57 indent level is 4 Nitrogen containing compound
[List of Patents for class 522 subclass 58]  58           Subclass 58 indent level is 4 Sulfenate, e.g., R-O-S-R, etc.
[List of Patents for class 522 subclass 59]  59           Subclass 59 indent level is 4 (O=S=O), e.g., sulfuryl or sulfonyl containing, etc.
[List of Patents for class 522 subclass 60]  60           Subclass 60 indent level is 3 Specified rate-affecting material is a peroxide
[List of Patents for class 522 subclass 61]  61           Subclass 61 indent level is 4 Hydroperoxide
[List of Patents for class 522 subclass 62]  62           Subclass 62 indent level is 3 Specified rate-affecting material contains a C-N=N-C-group
[List of Patents for class 522 subclass 63]  63           Subclass 63 indent level is 3 Specified rate-affecting material contains nitrogen or oxygen atom in heterocyclic ring
[List of Patents for class 522 subclass 64]  64           Subclass 64 indent level is 3 Specified rate-affecting material contains phosphorous
[List of Patents for class 522 subclass 65]  65           Subclass 65 indent level is 3 Specified rate-affecting material contains nitrogen
[List of Patents for class 522 subclass 66]  66           Subclass 66 indent level is 3 Specified rate-affecting material contains metal atom
[List of Patents for class 522 subclass 67]  67           Subclass 67 indent level is 3 Specified rate-affecting material contains halogen
[List of Patents for class 522 subclass 68]  68           Subclass 68 indent level is 3 Specified rate-affecting material contains oxygen
[List of Patents for class 522 subclass 69]  69           Subclass 69 indent level is 4 Phenolic, e.g., hydroquinone, etc.
[List of Patents for class 522 subclass 70]  70           Subclass 70 indent level is 3 Specified rate-affecting material contains only carbon and hydrogen
[List of Patents for class 522 subclass 71]  71           Subclass 71 indent level is 2 Processes of preparing or treating a solid polymer by wave energy in the presence of a designated nonreactant material (DNRM); or compositions therefore
[List of Patents for class 522 subclass 72]  72           Subclass 72 indent level is 3 Carbohydrate or derivative DNRM
[List of Patents for class 522 subclass 73]  73           Subclass 73 indent level is 3 Coal, asphaltic, or bituminous material DNRM
[List of Patents for class 522 subclass 74]  74           Subclass 74 indent level is 3 Organic DNRM
[List of Patents for class 522 subclass 75]  75           Subclass 75 indent level is 4 Heterocyclic ring containing DNRM
[List of Patents for class 522 subclass 76]  76           Subclass 76 indent level is 4 Phosphorous containing DNRM
[List of Patents for class 522 subclass 77]  77           Subclass 77 indent level is 4 Silicon containing DNRM
[List of Patents for class 522 subclass 78]  78           Subclass 78 indent level is 4 Nitrogen containing DNRM
[List of Patents for class 522 subclass 79]  79           Subclass 79 indent level is 4 Oxygen containing DNRM
[List of Patents for class 522 subclass 80]  80           Subclass 80 indent level is 4 Carbon and hydrogen only containing DNRM
[List of Patents for class 522 subclass 81]  81           Subclass 81 indent level is 3 Heavy metal containing DNRM
[List of Patents for class 522 subclass 82]  82           Subclass 82 indent level is 3 Phosphorous or sulfur containing DNRM
[List of Patents for class 522 subclass 83]  83           Subclass 83 indent level is 3 Oxygen containing DNRM
[List of Patents for class 522 subclass 84]  84           Subclass 84 indent level is 4 Water
[List of Patents for class 522 subclass 85]  85           Subclass 85 indent level is 5 Reacting an ethylenic monomer in the presence of a solid polymer
[List of Patents for class 522 subclass 86]  86           Subclass 86 indent level is 5 Treating a solid polymer
[List of Patents for class 522 subclass 87]  87           Subclass 87 indent level is 2 Processes involving protein as reactant or as solid polymer; or compositions therefore
[List of Patents for class 522 subclass 88]  88           Subclass 88 indent level is 2 Processes involving carbohydrate as reactant or as solid polymer; or compositions therefore
[List of Patents for class 522 subclass 89]  89           Subclass 89 indent level is 3 Preparing a polymer from carbohydrate and ethylenic reactant
[List of Patents for class 522 subclass 90]  90           Subclass 90 indent level is 2 Processes involving a polyurethane having terminal ethylenic unsaturation as reactant or as solid polymer; or compositions therefore
[List of Patents for class 522 subclass 91]  91           Subclass 91 indent level is 3 With a polysiloxane reactant or polymer
[List of Patents for class 522 subclass 92]  92           Subclass 92 indent level is 3 With a reactant containing ethylenic unsaturation derived from poly 1,2 epoxide or polymer
[List of Patents for class 522 subclass 93]  93           Subclass 93 indent level is 3 With polycarboxylic acid or derivative and a polyol, a condensate or solid polymer thereof reactant
[List of Patents for class 522 subclass 94]  94           Subclass 94 indent level is 3 With aldehyde or aldehyde derivative reactant, condensate or solid polymer thereof
[List of Patents for class 522 subclass 95]  95           Subclass 95 indent level is 3 With solid polymer derived solely from ethylenic monomers
[List of Patents for class 522 subclass 96]  96           Subclass 96 indent level is 3 With ethylenic reactant
[List of Patents for class 522 subclass 97]  97           Subclass 97 indent level is 3 Polyurethane has an oxygen other than as part of a urethane or carboxylic acid ester group
[List of Patents for class 522 subclass 98]  98           Subclass 98 indent level is 3 Polyurethane has at least one non-terminal ethylenic group
[List of Patents for class 522 subclass 99]  99           Subclass 99 indent level is 2 Processes involving a polysiloxane having ethylenic unsaturation as reactant or as solid polymer; or compositions therefore
[List of Patents for class 522 subclass 100]  100           Subclass 100 indent level is 2 Processes involving an ethylenically unsaturated material derived from poly 1,2-epoxide as reactant or a solid polymer; or compositions thereof
[List of Patents for class 522 subclass 101]  101           Subclass 101 indent level is 3 With polycarboxylic acid or derivative and a polyol, condensate or solid polymer thereof
[List of Patents for class 522 subclass 102]  102           Subclass 102 indent level is 3 With solid polymer derived solely from ethylencally unsaturated monomers
[List of Patents for class 522 subclass 103]  103           Subclass 103 indent level is 3 With ethylenic reactant
[List of Patents for class 522 subclass 104]  104           Subclass 104 indent level is 2 Processes involving an ethylenically unsaturated polyester derived from a polycarboxylic acid or derivative and polyol, condensate or solid polymer thereof; or compositions therefore
[List of Patents for class 522 subclass 105]  105           Subclass 105 indent level is 3 With aldehyde or aldehyde derivative reactant or polymer thereof
[List of Patents for class 522 subclass 106]  106           Subclass 106 indent level is 3 With solid polymer derived from ethylenically unsaturated monomers only
[List of Patents for class 522 subclass 107]  107           Subclass 107 indent level is 3 With ethylenic reactant
[List of Patents for class 522 subclass 108]  108           Subclass 108 indent level is 3 Condensate or solid polymer contains oxygen other than as part of a carboxylic acid ester moiety
[List of Patents for class 522 subclass 109]  109           Subclass 109 indent level is 2 Processes of chemically modifying a blend of two or more solid polymers in the presence of a chemical reactant; or compositions therefore
[List of Patents for class 522 subclass 110]  110           Subclass 110 indent level is 3 At least one solid polymer derived from ethylenic monomers has at least two ethylenic groups
[List of Patents for class 522 subclass 111]  111           Subclass 111 indent level is 2 Processes of treating a blend of two or more solid polymers or reacting one solid polymer with another solid polymer; or compositions therefore
[List of Patents for class 522 subclass 112]  112           Subclass 112 indent level is 3 At least two solid polymers derived from ethylenic monomers only
[List of Patents for class 522 subclass 113]  113           Subclass 113 indent level is 2 Processes of chemically modifying a solid polymer derived only from ethylenically unsaturated monomers by treating polymer with a chemical reactant; or compositions therefore
[List of Patents for class 522 subclass 114]  114           Subclass 114 indent level is 3 Chemical reactant is ethylenically unsaturated
[List of Patents for class 522 subclass 115]  115           Subclass 115 indent level is 4 Phosphorus
[List of Patents for class 522 subclass 116]  116           Subclass 116 indent level is 4 Nitrogen
[List of Patents for class 522 subclass 117]  117           Subclass 117 indent level is 5 Chemical reactant has two or more ethylenic groups
[List of Patents for class 522 subclass 118]  118           Subclass 118 indent level is 4 Sulfur
[List of Patents for class 522 subclass 119]  119           Subclass 119 indent level is 5 Chemical reactant has two or more ethylenic groups
[List of Patents for class 522 subclass 120]  120           Subclass 120 indent level is 4 Oxygen
[List of Patents for class 522 subclass 121]  121           Subclass 121 indent level is 5 Chemical reactant has two or more ethylenic groups
[List of Patents for class 522 subclass 122]  122           Subclass 122 indent level is 5 Hetero oxygen
[List of Patents for class 522 subclass 123]  123           Subclass 123 indent level is 5 Contains C-OH group other than as part of a COO-moiety
[List of Patents for class 522 subclass 124]  124           Subclass 124 indent level is 4 Carbon, hydrogen and halogen or carbon and halogen only
[List of Patents for class 522 subclass 125]  125           Subclass 125 indent level is 4 Carbon and hyrogen only
[List of Patents for class 522 subclass 126]  126           Subclass 126 indent level is 3 Chemical reactant contains nitrogen
[List of Patents for class 522 subclass 127]  127           Subclass 127 indent level is 3 Chemical reactant contains sulfur
[List of Patents for class 522 subclass 128]  128           Subclass 128 indent level is 4 Elemental sulfur
[List of Patents for class 522 subclass 129]  129           Subclass 129 indent level is 3 Chemical reacant contains oxygen
[List of Patents for class 522 subclass 130]  130           Subclass 130 indent level is 4 Contains C=O moiety
[List of Patents for class 522 subclass 131]  131           Subclass 131 indent level is 3 Chemical reactant is elemental halogen
[List of Patents for class 522 subclass 132]  132           Subclass 132 indent level is 4 Solid polymer treated contains halogen
[List of Patents for class 522 subclass 133]  133           Subclass 133 indent level is 4 Solid polymer derived from single monomer
[List of Patents for class 522 subclass 134]  134           Subclass 134 indent level is 2 Processes of chemically modifying a solid polymer or SICP derived from at least one saturated monomer by treating solid polymer or SICP with a chemical reactant; or compositions therefor
[List of Patents for class 522 subclass 135]  135           Subclass 135 indent level is 3 Chemical reactant is ethylenically unsaturated
[List of Patents for class 522 subclass 136]  136           Subclass 136 indent level is 4 Nitrogen
[List of Patents for class 522 subclass 137]  137           Subclass 137 indent level is 5 Chemical reactant has two or more ethylenic groups
[List of Patents for class 522 subclass 138]  138           Subclass 138 indent level is 5 Hetero nitrogen
[List of Patents for class 522 subclass 139]  139           Subclass 139 indent level is 5 N-C=O containing
[List of Patents for class 522 subclass 140]  140           Subclass 140 indent level is 6 Two or more N-C=O groups
[List of Patents for class 522 subclass 141]  141           Subclass 141 indent level is 4 Chalcogen
[List of Patents for class 522 subclass 142]  142           Subclass 142 indent level is 5 Chemical reactant has two or more ethylenic groups
[List of Patents for class 522 subclass 143]  143           Subclass 143 indent level is 5 Hetero oxygen
[List of Patents for class 522 subclass 144]  144           Subclass 144 indent level is 5 Carboxylic acid or derivative
[List of Patents for class 522 subclass 145]  145           Subclass 145 indent level is 4 Chemical reactant has two or more ethylenic groups and contains only carbon and hydrogen
[List of Patents for class 522 subclass 146]  146           Subclass 146 indent level is 3 Chemical reactant contains chalcogen
[List of Patents for class 522 subclass 147]  147           Subclass 147 indent level is 3 Chemical reactant contains halogen
[List of Patents for class 522 subclass 148]  148           Subclass 148 indent level is 2 Processes of treating a solid polymer or SICP derived from silicon containing reactant; or compositions therefore
[List of Patents for class 522 subclass 149]  149           Subclass 149 indent level is 2 Processes of treating a reaction product of a solid polymer and ethylenic reactant; or compositions therefore e.g., graft- or graft-type polymer, etc.
[List of Patents for class 522 subclass 150]  150           Subclass 150 indent level is 2 Processes of treating a solid polymer derived from ethylenic monomers only; or compositions therefore
[List of Patents for class 522 subclass 151]  151           Subclass 151 indent level is 3 Solid polymer derived from nitrogen containing monomer
[List of Patents for class 522 subclass 152]  152           Subclass 152 indent level is 4 Nitrogen containing monomer contains oxygen
[List of Patents for class 522 subclass 153]  153           Subclass 153 indent level is 3 Solid polymer derived from carboxylic acid or derivative monomer
[List of Patents for class 522 subclass 154]  154           Subclass 154 indent level is 4 Oxygen other than as part of carboxylic acid or derivative moiety
[List of Patents for class 522 subclass 155]  155           Subclass 155 indent level is 3 Solid polymer derived from halogen containing monomer
[List of Patents for class 522 subclass 156]  156           Subclass 156 indent level is 4 Halogen is fluorine
[List of Patents for class 522 subclass 157]  157           Subclass 157 indent level is 3 Solid polymer derived from monomer containing only carbon and hydrogen
[List of Patents for class 522 subclass 158]  158           Subclass 158 indent level is 4 At least one reactant contains two or more ethylenic groups
[List of Patents for class 522 subclass 159]  159           Subclass 159 indent level is 5 Polyisoprene or natural rubber
[List of Patents for class 522 subclass 160]  160           Subclass 160 indent level is 4 Carbocyclic ring containing, e.g., styrene, etc.
[List of Patents for class 522 subclass 161]  161           Subclass 161 indent level is 4 Derived from ethylene
[List of Patents for class 522 subclass 162]  162           Subclass 162 indent level is 2 Processes of treating a solid polymer or SICP derived from at least one nonethylenic reactant or compositions therefore
[List of Patents for class 522 subclass 163]  163           Subclass 163 indent level is 3 Solid polymer or SICP derived from reactant having halo-C(=O)-halo,halo C(=O)-O, or -O-C(=O)-O-group
[List of Patents for class 522 subclass 164]  164           Subclass 164 indent level is 3 Solid polymer or SICP derived from polycarboxylic acid or derivative and organic amine or from organic amine salt of a polycarboxylic acid
[List of Patents for class 522 subclass 165]  165           Subclass 165 indent level is 3 Solid polymer or SICP derived from polycarboxylic acid or derivative and polyol
[List of Patents for class 522 subclass 166]  166           Subclass 166 indent level is 3 Solid polymer or SICP derived from at least one heterocyclic monomer or aldehyde or aldehyde derivative
[List of Patents for class 522 subclass 167]  167           Subclass 167 indent level is 2 Processes of preparing a solid polymer from heterocyclic nitrogen monomers; or compositions therefore, e.g., carbazole, etc.
[List of Patents for class 522 subclass 168]  168           Subclass 168 indent level is 2 Processes of preparing a solid polymer from a heterocyclic chalogen monomer; or compsitions therefore
[List of Patents for class 522 subclass 169]  169           Subclass 169 indent level is 3 Two or more hetero atoms in hetero ring at least one of which is oxygen
[List of Patents for class 522 subclass 170]  170           Subclass 170 indent level is 3 1,2 epoxy
[List of Patents for class 522 subclass 171]  171           Subclass 171 indent level is 2 Processes of preparing a solid polymer from at least one phosphorous containing monomer; or compositions therefore
[List of Patents for class 522 subclass 172]  172           Subclass 172 indent level is 2 Processes of preparing a solid polymer from at least one silicon containing monomer; or compositions therefore
[List of Patents for class 522 subclass 173]  173           Subclass 173 indent level is 2 Processes of preparing a solid polymer from at least one nitrogen containing monomer; or compositions therefore
[List of Patents for class 522 subclass 174]  174           Subclass 174 indent level is 3 Nitrogen containing reactant contains a N-C=O or N-C=O moiety
[List of Patents for class 522 subclass 175]  175           Subclass 175 indent level is 4 Acrylamide or methacrylamide
[List of Patents for class 522 subclass 176]  176           Subclass 176 indent level is 3 Organic polyamine and polycarboxylic acid or derivative or from an organic amine salt of a polycarboxylic acid
[List of Patents for class 522 subclass 177]  177           Subclass 177 indent level is 3 Acrylonitrile or methacrylonitrile
[List of Patents for class 522 subclass 178]  178           Subclass 178 indent level is 2 Processes of preparing a solid polymer from at least one oxygen containing monomer; or compositions therefore
[List of Patents for class 522 subclass 179]  179           Subclass 179 indent level is 3 Polycarboxylic acid or derivative and polyol, or condensate thereof, e.g., dimethylterephthalate, etc.
[List of Patents for class 522 subclass 180]  180           Subclass 180 indent level is 3 Sulfur containing
[List of Patents for class 522 subclass 181]  181           Subclass 181 indent level is 3 Ether group
[List of Patents for class 522 subclass 182]  182           Subclass 182 indent level is 3 Carboxylic acid or derivative
[List of Patents for class 522 subclass 183]  183           Subclass 183 indent level is 4 Oxygen other than as part of a COO-group
[List of Patents for class 522 subclass 184]  184           Subclass 184 indent level is 2 Processes of preparing a solid polymer from ethylenic reactants only; or compositions therefore
[List of Patents for class 522 subclass 185]  185           Subclass 185 indent level is 3 Carbon, hydrogen and halogen only reactant contains at least three carbon atoms
[List of Patents for class 522 subclass 186]  186           Subclass 186 indent level is 3 At least one reactant contains two or more ethylenic groups
[List of Patents for class 522 subclass 187]  187           Subclass 187 indent level is 3 At least one reactant contains halogen
[List of Patents for class 522 subclass 188]  188           Subclass 188 indent level is 3 Derived from aromatic hydrocarbon
[List of Patents for class 522 subclass 189]  189           Subclass 189 indent level is 3 Derived from ethylene only
 
CROSS-REFERENCE ART COLLECTIONS
 
[List of Patents for class 522 subclass 901]  901           DARK STORAGE STABILIZER
[List of Patents for class 522 subclass 902]  902           AIR INHIBITION
[List of Patents for class 522 subclass 903]  903           REMOVAL OF RESIDUAL MONOMER
[List of Patents for class 522 subclass 904]  904           MONOMER OR POLYMER CONTAINS INITIATING GROUP
[List of Patents for class 522 subclass 905]  905           Subclass 905 indent level is 1 Benzophenone group
[List of Patents for class 522 subclass 906]  906           PREPARING SHRINKABLE MATERIAL
[List of Patents for class 522 subclass 907]  907           INVOLVING PRECURSOR OF AN ULTRAVIOLET ABSORBER, E.G., MONOBENZOATE, ETC.
[List of Patents for class 522 subclass 908]  908           DENTAL UTILITY
[List of Patents for class 522 subclass 909]  909           SOLVENTLESS INK
[List of Patents for class 522 subclass 910]  910           TREATMENT THROUGH AN EXTERNAL FILTER OR MASK (NONPHOTOGRAGHIC PROCESS)
[List of Patents for class 522 subclass 911]  911           SPECIFIED TREATMENT INVOLVING MEGARAD OR LESS
[List of Patents for class 522 subclass 912]  912           Subclass 912 indent level is 1 Polymer derived from ethylenic monomers only
[List of Patents for class 522 subclass 913]  913           NUMERICALLY SPECIFIED DISTINCT WAVELENGTH
[List of Patents for class 522 subclass 914]  914           Subclass 914 indent level is 1 Wavelength of 200 nanometers or less
[List of Patents for class 522 subclass 915]  915           INVOLVING INERT GAS, STEAM, NITROGEN GAS, OR CARBON DIOXIDE
 
FOREIGN ART COLLECTIONS
 
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