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[Search a list of Patent Appplications for class 526]  Class   526SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES
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This Class 526 is considered to be an integral part of Class 520 (see the Class 520 schedule for the position of this Class in schedule hierarchy). This Class retains all pertinent definitions and class lines of Class 520
              SYNTHETIC RESINS (CLASS 520, SUBCLASS 1)
[List of Patents for class 526 subclass 59]  59           Subclass 59 indent level is 1 EFFECTING A CHANGE IN A POLYMERIZATION PROCESS IN RESPONSE TO A MEASUREMENT OR TEST
[List of Patents for class 526 subclass 60]  60           Subclass 60 indent level is 2 Change responsive to composition property other than density
[List of Patents for class 526 subclass 61]  61           Subclass 61 indent level is 2 Change responsive to pressure or temperature
[List of Patents for class 526 subclass 62]  62           Subclass 62 indent level is 1 POLYMERIZING IN REACTOR OF SPECIFIED MATERIAL, OR IN REACTOR IN WHICH SURFACE CONTACTING POLYMERIZING MATERIAL HAS BEEN TREATED
[List of Patents for class 526 subclass 63]  63           Subclass 63 indent level is 1 POLYMERIZING IN PRESENCE OF INERT SOLID MASSES SO AS TO HEAT, COOL, OR GRIND POLYMERIZING MASS
[List of Patents for class 526 subclass 64]  64           Subclass 64 indent level is 1 POLYMERIZING IN TUBULAR OR LOOP REACTOR
[List of Patents for class 526 subclass 65]  65           Subclass 65 indent level is 1 POLYMERIZING IN TWO OR MORE PHYSICALLY DISTINCT ZONES
[List of Patents for class 526 subclass 66]  66           Subclass 66 indent level is 2 Adding material to polymerization zone in an incremental or sequential manner
[List of Patents for class 526 subclass 67]  67           Subclass 67 indent level is 1 REMOVING AND RECYCLING REMOVED MATERIAL FROM AN ONGOING POLYMERIZATION ZONE TO A POLYMERIZATION ZONE
[List of Patents for class 526 subclass 68]  68           Subclass 68 indent level is 2 Recycling monomer
[List of Patents for class 526 subclass 69]  69           Subclass 69 indent level is 2 Recycling catalyst
[List of Patents for class 526 subclass 70]  70           Subclass 70 indent level is 2 Recycling diluent
[List of Patents for class 526 subclass 71]  71           Subclass 71 indent level is 1 REMOVING ONLY NONPOLYMERIZED OR NONPOLYMERIZABLE MATERIAL DURING POLYMERIZATION PROCESS
[List of Patents for class 526 subclass 72]  72           Subclass 72 indent level is 1 POLYMERS FROM ONLY ETHYLENIC MONOMERS OR PROCESSES OF POLYMERIZING, POLYMERIZABLE COMPOSITIONS CONTAINING ONLY ETHYLENIC MONOMERS AS REACTANTS OR PROCESSES OF PREPARING
[List of Patents for class 526 subclass 73]  73           Subclass 73 indent level is 2 Polymerization involving two or more specified temperature or pressure conditions
[List of Patents for class 526 subclass 74]  74           Subclass 74 indent level is 2 Utilizing material during polymerization to prevent or remove reactor buildup, e.g., fouling, clogging, etc.
[List of Patents for class 526 subclass 75]  75           Subclass 75 indent level is 2 Including step of synthesis of monomer or pre-polymer
[List of Patents for class 526 subclass 76]  76           Subclass 76 indent level is 3 Polymerizable material derived from petroleum fraction
[List of Patents for class 526 subclass 77]  77           Subclass 77 indent level is 2 Including step of purifying monomer
[List of Patents for class 526 subclass 78]  78           Subclass 78 indent level is 2 Adding material to an on-going polymerization reaction, said addition being other than the continuous addition of the initial charge
[List of Patents for class 526 subclass 79]  79           Subclass 79 indent level is 3 Adding in an incremental or sequential manner
[List of Patents for class 526 subclass 80]  80           Subclass 80 indent level is 4 Polymerizing in the presence of water
[List of Patents for class 526 subclass 81]  81           Subclass 81 indent level is 5 Added material is other than monomer per se, or composition containing monomer
[List of Patents for class 526 subclass 82]  82           Subclass 82 indent level is 3 Adding polymerization inhibitor or terminator, e.g., short-stopper, etc.
[List of Patents for class 526 subclass 83]  83           Subclass 83 indent level is 4 Added material contains nitrogen compound
[List of Patents for class 526 subclass 84]  84           Subclass 84 indent level is 4 Added material contains oxygen compound
[List of Patents for class 526 subclass 85]  85           Subclass 85 indent level is 4 Added material contains sulfur atom
[List of Patents for class 526 subclass 86]  86           Subclass 86 indent level is 3 Adding catalyst or catalyst component
[List of Patents for class 526 subclass 87]  87           Subclass 87 indent level is 3 Adding monomer
[List of Patents for class 526 subclass 88]  88           Subclass 88 indent level is 2 Polymerization involving specified mixing, stirring, agitating, or movement of material
[List of Patents for class 526 subclass 89]  89           Subclass 89 indent level is 2 Polymerizing in the presence of a specified material other than monomer
[List of Patents for class 526 subclass 90]  90           Subclass 90 indent level is 3 Material contains transition metal or compound thereof
[List of Patents for class 526 subclass 91]  91           Subclass 91 indent level is 4 In presence of water
[List of Patents for class 526 subclass 92]  92           Subclass 92 indent level is 5 Carbon-metal bond
[List of Patents for class 526 subclass 93]  93           Subclass 93 indent level is 5 Group VIII transition metal (Fe, Co, Ni, Ru, Rh, Pd, Os, Ir, Pt)
[List of Patents for class 526 subclass 94]  94           Subclass 94 indent level is 6 With organo-sulfur compound or organic-transition metal compound containing sulfur atom
[List of Patents for class 526 subclass 95]  95           Subclass 95 indent level is 4 Material contains transition metal oxide (other than peroxide)
[List of Patents for class 526 subclass 96]  96           Subclass 96 indent level is 5 Contains elemental transition metal or a non-oxide compound of a transition metal
[List of Patents for class 526 subclass 97]  97           Subclass 97 indent level is 6 Contains non-transition elemental metal, hydride thereof, or carbon to non-transition metal atom bond
[List of Patents for class 526 subclass 98]  98           Subclass 98 indent level is 5 Contains non-metallic halogen-containing material
[List of Patents for class 526 subclass 99]  99           Subclass 99 indent level is 5 Contains compound containing aluminum to halogen bond and wherein the same aluminum atom is not bonded to a hydrogen or carbon atom
[List of Patents for class 526 subclass 100]  100           Subclass 100 indent level is 5 Contains non-metal organic N, O, S or P containing compound
[List of Patents for class 526 subclass 101]  101           Subclass 101 indent level is 5 Two or more transition metal oxides, at least two of said oxides being other than oxides of Ti, Zr, Hf, or Th
[List of Patents for class 526 subclass 102]  102           Subclass 102 indent level is 5 Contains non-transition heavy metal or compound thereof
[List of Patents for class 526 subclass 103]  103           Subclass 103 indent level is 5 Group VIII metal oxide (Fe, Co, Ni, Ru, Rh, Pd, Os, Ir, Pt)
[List of Patents for class 526 subclass 104]  104           Subclass 104 indent level is 5 Group VIB metal oxide (Cr, Mo, W)
[List of Patents for class 526 subclass 105]  105           Subclass 105 indent level is 6 Contains non-transition elemental metal, hydride thereof, or nontransition metal to carbon atom bond
[List of Patents for class 526 subclass 106]  106           Subclass 106 indent level is 6 Metal oxide is of chromium
[List of Patents for class 526 subclass 107]  107           Subclass 107 indent level is 5 Group IVB metal oxide (Ti, Zr, Hf)
[List of Patents for class 526 subclass 108]  108           Subclass 108 indent level is 4 Contains one or more elemental transition metal atoms
[List of Patents for class 526 subclass 109]  109           Subclass 109 indent level is 5 With peroxy compound (-O-O-)
[List of Patents for class 526 subclass 110]  110           Subclass 110 indent level is 5 With non-transition elemental metal, hydride thereof, or carbon to non transition metal atom bond
[List of Patents for class 526 subclass 111]  111           Subclass 111 indent level is 6 With non-metal P, S, O, or N containing material
[List of Patents for class 526 subclass 112]  112           Subclass 112 indent level is 5 With transition metal compound
[List of Patents for class 526 subclass 113]  113           Subclass 113 indent level is 4 Two or more diverse transition metal atoms in distinct compounds or in the same compound
[List of Patents for class 526 subclass 114]  114           Subclass 114 indent level is 5 Contains non-transition elemental metal, hydride thereof, or carbon to non transition metal atom bond
[List of Patents for class 526 subclass 115]  115           Subclass 115 indent level is 6 Contains Group VIII metal atom (Fe, Co, Ni, Ru, Rh, Pd, Os, Ir, Pt)
[List of Patents for class 526 subclass 116]  116           Subclass 116 indent level is 6 At least one Group IVB metal atom (Ti, Zr, Hf) and at least one Group VB meta l (V, Nb, Ta)
[List of Patents for class 526 subclass 117]  117           Subclass 117 indent level is 5 Contains Group VIII metal atom (Fe, Co, Ni, Ru, Rh, Pd, Os, Ir, Pt)
[List of Patents for class 526 subclass 118]  118           Subclass 118 indent level is 4 Material contains two or more different compounds of same transition metal
[List of Patents for class 526 subclass 119]  119           Subclass 119 indent level is 5 Contains non-transition elemental metal, hydride thereof, or carbon to non-transition metal atom bond
[List of Patents for class 526 subclass 120]  120           Subclass 120 indent level is 4 Material contains compound of non-transition heavy metal wherein non-transition heavy metal is not bonded to hydrogen or carbon
[List of Patents for class 526 subclass 121]  121           Subclass 121 indent level is 5 Contains non-transition elemental metal, hydride thereof, or carbon to non-transition metal atom bond
[List of Patents for class 526 subclass 122]  122           Subclass 122 indent level is 6 Nontransition heavy metal compound is halogen-containing
[List of Patents for class 526 subclass 123.1]  123.1           Subclass 123.1 indent level is 4 Material contains compound of Group IA (Li, Na, K, Rb, Cs, Fr) or Group IIA (Be, Mg, Ca, Sr, Ba, Ra) metal wherein IA or IIA metal is not bonded to hydrogen or to carbon
[List of Patents for class 526 subclass 124.1]  124.1           Subclass 124.1 indent level is 5 Contains nontransition elemental metal, hydride thereof, or carbon to non-transition metal atom bond
[List of Patents for class 526 subclass 124.2]  124.2           Subclass 124.2 indent level is 6 Contains a magnesium compound as the Group IIA metal compound
[List of Patents for class 526 subclass 124.3]  124.3           Subclass 124.3 indent level is 7 Contains at least one additional specified material
[List of Patents for class 526 subclass 124.4]  124.4           Subclass 124.4 indent level is 8 Contains two or more magnesium compounds having no H to magnesium or C to magnesium bonds or at least one additional said Group IA or IIA compound
[List of Patents for class 526 subclass 124.5]  124.5           Subclass 124.5 indent level is 8 Contains Si or Al inorganic oxygen-containing compound
[List of Patents for class 526 subclass 124.6]  124.6           Subclass 124.6 indent level is 9 Contains organic non-metal containing B, Si, N, P, or chalcogen material
[List of Patents for class 526 subclass 124.7]  124.7           Subclass 124.7 indent level is 8 Contains at least two non-transition elemental metals, hydrides thereof, or compounds containing carbon to non-transition metal atom bond, or mixtures thereof
[List of Patents for class 526 subclass 124.8]  124.8           Subclass 124.8 indent level is 9 Contains organic non-metal containing B, Si, N, P, or chalcogen material
[List of Patents for class 526 subclass 124.9]  124.9           Subclass 124.9 indent level is 8 Contains organic non-metal containing B, Si, N, P, or chalcogen material
[List of Patents for class 526 subclass 125.1]  125.1           Subclass 125.1 indent level is 9 Contains organic Al compound containing no H to aluminum or C to aluminum bonds
[List of Patents for class 526 subclass 125.2]  125.2           Subclass 125.2 indent level is 9 Contains compound containing only C, H and halogen atoms or only C and halogen atoms
[List of Patents for class 526 subclass 125.3]  125.3           Subclass 125.3 indent level is 9 Contains organic non-metal containing B or Si material
[List of Patents for class 526 subclass 125.4]  125.4           Subclass 125.4 indent level is 9 Contains at least one inorganic material having no H to metal bonds
[List of Patents for class 526 subclass 125.5]  125.5           Subclass 125.5 indent level is 10 At least one of said inorganic materials is an Al halide
[List of Patents for class 526 subclass 125.6]  125.6           Subclass 125.6 indent level is 9 Contains at least two organic non-metal containing N, P, or chalcogen materials
[List of Patents for class 526 subclass 125.7]  125.7           Subclass 125.7 indent level is 8 Contains compound containing only C, H and halogen atoms or only C and halogen atoms
[List of Patents for class 526 subclass 125.8]  125.8           Subclass 125.8 indent level is 8 Contains at least one inorganic material having no H to metal bonds
[List of Patents for class 526 subclass 126]  126           Subclass 126 indent level is 4 Material contains silicon atom
[List of Patents for class 526 subclass 127]  127           Subclass 127 indent level is 5 Contains non-transition free metal, hydride thereof, or carbon to non-transition metal atom bond
[List of Patents for class 526 subclass 128]  128           Subclass 128 indent level is 6 Silicon present in organic non-metal compound
[List of Patents for class 526 subclass 129]  129           Subclass 129 indent level is 6 Silicon present in inorganic oxygen-containing compound
[List of Patents for class 526 subclass 130]  130           Subclass 130 indent level is 5 Silicon present in inorganic oxygen-containing compound
[List of Patents for class 526 subclass 131]  131           Subclass 131 indent level is 4 Material contains boron atom
[List of Patents for class 526 subclass 132]  132           Subclass 132 indent level is 5 Contains non-transition elemental metal, hydride thereof, or carbon to non transition metal atom bond
[List of Patents for class 526 subclass 133]  133           Subclass 133 indent level is 6 Boron compound is halogen-containing
[List of Patents for class 526 subclass 134]  134           Subclass 134 indent level is 5 Boron compound contains boron bonded to hydrogen or to carbon atom
[List of Patents for class 526 subclass 135]  135           Subclass 135 indent level is 4 With non-metal N, P, O, S, Se, Te, or halogen material other than nitrogen gas
[List of Patents for class 526 subclass 136]  136           Subclass 136 indent level is 5 Contains non-transition elemental metal, hydride thereof, or carbon to non transition metal atom bond
[List of Patents for class 526 subclass 137]  137           Subclass 137 indent level is 6 Non-metal material is inorganic halogen-containing material
[List of Patents for class 526 subclass 138]  138           Subclass 138 indent level is 6 Non-metal material is inorganic oxygen-containing material
[List of Patents for class 526 subclass 139]  139           Subclass 139 indent level is 6 Non-metal material is organic phosphorus-containing compound
[List of Patents for class 526 subclass 140]  140           Subclass 140 indent level is 6 Non-metal material is organic sulfur-containing compound
[List of Patents for class 526 subclass 141]  141           Subclass 141 indent level is 6 Non-metal material is organic nitrogen-containing compound
[List of Patents for class 526 subclass 142]  142           Subclass 142 indent level is 6 Non-metal material is organic oxygen-containing compound
[List of Patents for class 526 subclass 143]  143           Subclass 143 indent level is 7 Non-metal organic oxygen compound is halogen-containing
[List of Patents for class 526 subclass 144]  144           Subclass 144 indent level is 6 Non-metal material is organic halogen-containing compound
[List of Patents for class 526 subclass 145]  145           Subclass 145 indent level is 5 Non-metal phosphorus-containing material
[List of Patents for class 526 subclass 146]  146           Subclass 146 indent level is 5 Non-metal sulfur-containing material
[List of Patents for class 526 subclass 147]  147           Subclass 147 indent level is 5 Non-metal nitrogen-containing material
[List of Patents for class 526 subclass 148]  148           Subclass 148 indent level is 4 Contains two or more diverse non-transition elemental metals, different non-transition hydride compounds, different carbon to non transition metal compounds, or mixture thereof
[List of Patents for class 526 subclass 149]  149           Subclass 149 indent level is 5 At least one atom of As, Sb, or Bi, in elemental form or bonded to hydrogen or carbon atom
[List of Patents for class 526 subclass 150]  150           Subclass 150 indent level is 5 At least one atom of Ge, Sn, or Pb in elemental form or bonded to hydrogen or carbon atom
[List of Patents for class 526 subclass 151]  151           Subclass 151 indent level is 5 At least one atom of Group IIIA metal (Al, Ga, In, Tl) in elemental form or bonded to hydrogen or carbon atom
[List of Patents for class 526 subclass 152]  152           Subclass 152 indent level is 6 At least one atom of Group IA metal (Li, Na, K, Rb, Cs, Fr) in elemental form or bonded to hydrogen or carbon atom
[List of Patents for class 526 subclass 153]  153           Subclass 153 indent level is 6 Two or more Group IIIA metals in elemental form or bonded to hydrogen or carbon atom
[List of Patents for class 526 subclass 154]  154           Subclass 154 indent level is 4 Material contains aluminum compound wherein aluminum atom is not bonded to hydrogen or carbon atom
[List of Patents for class 526 subclass 155]  155           Subclass 155 indent level is 5 Contains non-transition elemental metal, hydride thereof or carbon to non transition metal atom bond
[List of Patents for class 526 subclass 156]  156           Subclass 156 indent level is 6 Inorganic oxygen containing aluminum compound
[List of Patents for class 526 subclass 157]  157           Subclass 157 indent level is 6 Aluminum trihalide
[List of Patents for class 526 subclass 158]  158           Subclass 158 indent level is 7 With Group IVB transition metal compound (Ti, Zr, Hf)
[List of Patents for class 526 subclass 159]  159           Subclass 159 indent level is 4 Material contains non-transition elemental metal, hydride thereof, or carbon to non-transition metal atom bond
[List of Patents for class 526 subclass 160]  160           Subclass 160 indent level is 5 Transition metal bonded to carbon atom
[List of Patents for class 526 subclass 161]  161           Subclass 161 indent level is 5 Transition metal compound contains P, S, or N atom
[List of Patents for class 526 subclass 162]  162           Subclass 162 indent level is 5 Non-transition metal is bonded to carbon atom in compound which contains ethylenic unsaturation
[List of Patents for class 526 subclass 163]  163           Subclass 163 indent level is 5 Non-transition metal hydride or carbon to non-transition metal metal atom bond compound contains P, S, or N atom
[List of Patents for class 526 subclass 164]  164           Subclass 164 indent level is 5 Transition metal is IB, IIIB, VIIB or atomic number 58-71, 88, 90 or higher
[List of Patents for class 526 subclass 165]  165           Subclass 165 indent level is 5 Non-transition metal to carbon atom bond compound contains at least two atoms of same or different non-transition metal
[List of Patents for class 526 subclass 166]  166           Subclass 166 indent level is 5 Group IVA (Ge, Sn, Pb) or Group VA (As, Sb, Bi) metal is bonded to hydrogen or carbon atom
[List of Patents for class 526 subclass 167]  167           Subclass 167 indent level is 5 Elemental non-transition metal atom
[List of Patents for class 526 subclass 168]  168           Subclass 168 indent level is 5 Elemental carbon
[List of Patents for class 526 subclass 169]  169           Subclass 169 indent level is 5 Transition metal is Group VB, VIB or VIII metal
[List of Patents for class 526 subclass 169.1]  169.1           Subclass 169.1 indent level is 6 Transition metal is Group VIII
[List of Patents for class 526 subclass 169.2]  169.2           Subclass 169.2 indent level is 6 Transition metal is vanadium
[List of Patents for class 526 subclass 169.3]  169.3           Subclass 169.3 indent level is 5 At least one monomer is nonhydrocarbon material
[List of Patents for class 526 subclass 170]  170           Subclass 170 indent level is 4 Transition metal bonded to carbon atom
[List of Patents for class 526 subclass 171]  171           Subclass 171 indent level is 5 Transition metal is Group VIII (Fe, Co, Ni, Ru, Ph, Pd, Os, Ir, Pt)
[List of Patents for class 526 subclass 172]  172           Subclass 172 indent level is 4 Transition metal compound has at least one atom of P, S, N or O therein
[List of Patents for class 526 subclass 173]  173           Subclass 173 indent level is 3 Material contains elemental alkali metal, hydride thereof, or alkali metal to carbon atom bond (Li, Na, K, Rb, Cs, Fr)
[List of Patents for class 526 subclass 174]  174           Subclass 174 indent level is 4 Contains at least two diverse alkali metal atoms, at least one of which is in the form of a free alkali metal, or in the form of a hydride, or has an alkali metal to carbon atom bond
[List of Patents for class 526 subclass 175]  175           Subclass 175 indent level is 4 Contains two or more separate chemical entities containing atoms of the same alkali metal, with at least one atom in elemental form, or in the form of a hydride, or has an alkali metal to carbon atom bond
[List of Patents for class 526 subclass 176]  176           Subclass 176 indent level is 4 Contains heavy metal atom
[List of Patents for class 526 subclass 177]  177           Subclass 177 indent level is 4 Contains aluminum atom
[List of Patents for class 526 subclass 178]  178           Subclass 178 indent level is 4 Contains boron or silicon atom
[List of Patents for class 526 subclass 179]  179           Subclass 179 indent level is 4 Contains phosphorus atom
[List of Patents for class 526 subclass 180]  180           Subclass 180 indent level is 4 Contains compound of nitrogen
[List of Patents for class 526 subclass 181]  181           Subclass 181 indent level is 4 Contains oxygen atom
[List of Patents for class 526 subclass 182]  182           Subclass 182 indent level is 4 Contains halogen atom
[List of Patents for class 526 subclass 183]  183           Subclass 183 indent level is 3 Material contains metal atom bonded to a carbon atom
[List of Patents for class 526 subclass 184]  184           Subclass 184 indent level is 4 With free oxygen or peroxy compound (-O-O-)
[List of Patents for class 526 subclass 185]  185           Subclass 185 indent level is 4 Metal bonded to carbon is aluminum
[List of Patents for class 526 subclass 186]  186           Subclass 186 indent level is 5 Contains aluminum not bonded to carbon
[List of Patents for class 526 subclass 187]  187           Subclass 187 indent level is 5 Contains Group IA or IIA atom
[List of Patents for class 526 subclass 188]  188           Subclass 188 indent level is 5 Contains heavy metal atom
[List of Patents for class 526 subclass 189]  189           Subclass 189 indent level is 5 Contains P, N, S, or O atom
[List of Patents for class 526 subclass 190]  190           Subclass 190 indent level is 4 Metal bonded to carbon atom is a heavy metal atom
[List of Patents for class 526 subclass 191]  191           Subclass 191 indent level is 3 Material contains elemental metal
[List of Patents for class 526 subclass 192]  192           Subclass 192 indent level is 3 Material contains a heavy metal atom containing organic compound
[List of Patents for class 526 subclass 193]  193           Subclass 193 indent level is 3 Material contains organic compound having a phosphorus atom
[List of Patents for class 526 subclass 194]  194           Subclass 194 indent level is 3 Material contains Si, Te, Se, or Group VIIIA atom, e.g., He, Ne, etc.
[List of Patents for class 526 subclass 195]  195           Subclass 195 indent level is 3 Material contains boron compound other than boron trihalide or non-metal organic complex of boron trihalide
[List of Patents for class 526 subclass 196]  196           Subclass 196 indent level is 4 Boron bonded to hydrogen or carbon atom compound
[List of Patents for class 526 subclass 197]  197           Subclass 197 indent level is 5 With free oxygen or peroxy compound
[List of Patents for class 526 subclass 198]  198           Subclass 198 indent level is 5 Contains P, S, or N atom other than as elemental nitrogen
[List of Patents for class 526 subclass 199]  199           Subclass 199 indent level is 3 Material contains polypeptide, e.g., protein, gelatin, etc.
[List of Patents for class 526 subclass 200]  200           Subclass 200 indent level is 3 Material contains carbohydrate, e.g., starch, sugar, etc.
[List of Patents for class 526 subclass 201]  201           Subclass 201 indent level is 3 Material contains previously formed normally solid polymer which is distinct from polymer to be formed and is a polymer formed from at least one ethylenic monomer
[List of Patents for class 526 subclass 202]  202           Subclass 202 indent level is 4 Normally solid polymer contains free alcohol group or alcoholate thereof
[List of Patents for class 526 subclass 203]  203           Subclass 203 indent level is 4 Normally solid polymer is formed from ethylenically unsaturated dicarboxylic acid, ester, salt, or anhydride thereof
[List of Patents for class 526 subclass 204]  204           Subclass 204 indent level is 3 Material contains heterocyclic compound
[List of Patents for class 526 subclass 205]  205           Subclass 205 indent level is 4 Sulfur and nitrogen together in a single ring
[List of Patents for class 526 subclass 206]  206           Subclass 206 indent level is 3 Material contains halogenated hydrocarbon wherein at least one halogen atom is other than chlorine, and mixtures of water and a halogenated hydrocarbon one ethylenic monomer
[List of Patents for class 526 subclass 207]  207           Subclass 207 indent level is 3 Material contains water and a hydrocarbon
[List of Patents for class 526 subclass 208]  208           Subclass 208 indent level is 3 Material contains aldehyde or ketone or polymeric reaction product thereof, e.g., urea-formaldehyde, etc.
[List of Patents for class 526 subclass 209]  209           Subclass 209 indent level is 3 Material contains ether
[List of Patents for class 526 subclass 210]  210           Subclass 210 indent level is 3 Material contains alcohol or alcoholate
[List of Patents for class 526 subclass 211]  211           Subclass 211 indent level is 4 Alcohol or alcoholate has at least one atom of nitrogen or sulfur chemically combined therewith
[List of Patents for class 526 subclass 212]  212           Subclass 212 indent level is 4 Alcohol contains a single hydroxy group or is alcoholate thereof
[List of Patents for class 526 subclass 213]  213           Subclass 213 indent level is 3 Material contains carboxylic acid, salt, ester, or anhydride thereof
[List of Patents for class 526 subclass 214]  214           Subclass 214 indent level is 4 Derived from carboxylic acid containing at least one atom of halogen or sulfur
[List of Patents for class 526 subclass 215]  215           Subclass 215 indent level is 4 Derived from carboxylic acid containing at least one atom of nitrogen
[List of Patents for class 526 subclass 216]  216           Subclass 216 indent level is 4 Derived from aliphatic acid
[List of Patents for class 526 subclass 217]  217           Subclass 217 indent level is 3 Material contains organic nitrogen compound
[List of Patents for class 526 subclass 218.1]  218.1           Subclass 218.1 indent level is 4 Organic compound contains N=N or N-N group
[List of Patents for class 526 subclass 219]  219           Subclass 219 indent level is 5 Organic N-N or N=N containing compound also contains at least one S or O chemically bound therein
[List of Patents for class 526 subclass 219.1]  219.1           Subclass 219.1 indent level is 5 Organic N=N or N-N group containing compound contains carbocyclic group or element other than C,H, or N
[List of Patents for class 526 subclass 219.2]  219.2           Subclass 219.2 indent level is 5 N=N or N-N group-containing compound is a catalyst admixed with at least one other catalyst, co-catalyst, or accelerator, e.g., redox catalyst, etc.
[List of Patents for class 526 subclass 219.3]  219.3           Subclass 219.3 indent level is 5 Contains specified ingredient other than the N=N or N-N group containing compound, or water, or defined hydrocarbon or defined halogenated hydrocarbon
[List of Patents for class 526 subclass 219.4]  219.4           Subclass 219.4 indent level is 6 Ingredient contains halogenated hydrocarbon
[List of Patents for class 526 subclass 219.5]  219.5           Subclass 219.5 indent level is 6 Ingredient contains water, e.g., an emulsion, dispersion, etc.
[List of Patents for class 526 subclass 219.6]  219.6           Subclass 219.6 indent level is 5 Azobisisobutyronitrile (AIBN)
[List of Patents for class 526 subclass 220]  220           Subclass 220 indent level is 4 Organic nitrogen compound contains at least one S or O atom chemically bound therein
[List of Patents for class 526 subclass 221]  221           Subclass 221 indent level is 3 Material contains inorganic heavy metal compound
[List of Patents for class 526 subclass 222]  222           Subclass 222 indent level is 3 Material contains organic sulfur compound
[List of Patents for class 526 subclass 223]  223           Subclass 223 indent level is 4 Organic sulfur compound contains -S-S- or -O-O-group
[List of Patents for class 526 subclass 224]  224           Subclass 224 indent level is 4 Mercaptan
[List of Patents for class 526 subclass 225]  225           Subclass 225 indent level is 4 Organic compound contains hexavalent S atom, e.g., organosulfate, sulfonate, etc.
[List of Patents for class 526 subclass 226]  226           Subclass 226 indent level is 3 Material contains aluminum compound other than aluminum trihalide or nonmetallic organic complex of aluminum trihalide
[List of Patents for class 526 subclass 227]  227           Subclass 227 indent level is 3 Material contains peroxy group compound (-O-O-)
[List of Patents for class 526 subclass 228]  228           Subclass 228 indent level is 4 Two or more peroxide compounds
[List of Patents for class 526 subclass 229]  229           Subclass 229 indent level is 4 Inorganic peroxide, e.g., persulfate, hydrogen peroxide, etc.
[List of Patents for class 526 subclass 229.5]  229.5           Subclass 229.5 indent level is 5 Nitrogen- or halogen-containing inorganic -0-0- compound free of sulfur, or wherein an -0-0- compound is in admixture with a compound devoid of sulfur and containing a N, halogen or P atom
[List of Patents for class 526 subclass 230]  230           Subclass 230 indent level is 4 Hydroperoxide
[List of Patents for class 526 subclass 230.5]  230.5           Subclass 230.5 indent level is 4 Peroxy carbonate
[List of Patents for class 526 subclass 231]  231           Subclass 231 indent level is 4 Peroxide contains halogen atom chemically combined therein
[List of Patents for class 526 subclass 232]  232           Subclass 232 indent level is 4 Peroxide contains an aryl group
[List of Patents for class 526 subclass 232.1]  232.1           Subclass 232.1 indent level is 5 Benzoyl peroxide
[List of Patents for class 526 subclass 232.3]  232.3           Subclass 232.3 indent level is 4 Two or more peroxy groups in same compound
[List of Patents for class 526 subclass 232.5]  232.5           Subclass 232.5 indent level is 4 Cycloaliphatic or ethylenically unsaturated peroxy-containing compound
[List of Patents for class 526 subclass 233]  233           Subclass 233 indent level is 3 Material contains elemental phosphorus or inorganic phosphorus compound
[List of Patents for class 526 subclass 234]  234           Subclass 234 indent level is 3 Material contains sulfur or inorganic sulfur compound
[List of Patents for class 526 subclass 235]  235           Subclass 235 indent level is 3 Material contains free oxygen, air, or ozone
[List of Patents for class 526 subclass 236]  236           Subclass 236 indent level is 3 Material contains nitrogen compound
[List of Patents for class 526 subclass 237]  237           Subclass 237 indent level is 3 Material contains metal halide, boron halide or organic complexes thereof, hydrogen halide, elemental halogen, or compound containing only halogen atoms
[List of Patents for class 526 subclass 238]  238           Subclass 238 indent level is 4 At least one monomer is nonhydrocarbon material
[List of Patents for class 526 subclass 238.1]  238.1           Subclass 238.1 indent level is 2 From protein or biologically active polypeptide containing monomer
[List of Patents for class 526 subclass 238.2]  238.2           Subclass 238.2 indent level is 2 From carbohydrate, tannin, or derivative containing monomer
[List of Patents for class 526 subclass 238.21]  238.21           Subclass 238.21 indent level is 3 Cellulose or derivative containing monomer
[List of Patents for class 526 subclass 238.22]  238.22           Subclass 238.22 indent level is 3 Starch or derivative containing monomer, e.g., starch-acrylamide, etc.
[List of Patents for class 526 subclass 238.23]  238.23           Subclass 238.23 indent level is 3 Mono- or di-saccharide containing monomer, e.g., allyl sucrose, etc.
[List of Patents for class 526 subclass 238.3]  238.3           Subclass 238.3 indent level is 2 From natural resin or derivative containing monomer
[List of Patents for class 526 subclass 239]  239           Subclass 239 indent level is 2 From boron containing monomer
[List of Patents for class 526 subclass 240]  240           Subclass 240 indent level is 2 From metal containing monomer
[List of Patents for class 526 subclass 241]  241           Subclass 241 indent level is 3 Transition metal containing
[List of Patents for class 526 subclass 242]  242           Subclass 242 indent level is 2 From fluorine containing monomer
[List of Patents for class 526 subclass 243]  243           Subclass 243 indent level is 3 Fluorine-containing monomer contains a sulfur atom
[List of Patents for class 526 subclass 244]  244           Subclass 244 indent level is 3 Fluorine-containing monomer is a ketone or aldehyde
[List of Patents for class 526 subclass 245]  245           Subclass 245 indent level is 3 Fluorine containing monomer is a mono-carboxylic acid ester
[List of Patents for class 526 subclass 246]  246           Subclass 246 indent level is 4 Alcohol derived portion of ester contains ether group
[List of Patents for class 526 subclass 247]  247           Subclass 247 indent level is 3 Fluorine containing monomer is an ether
[List of Patents for class 526 subclass 248]  248           Subclass 248 indent level is 3 Fluorine containing monomer contains nitrogen atom
[List of Patents for class 526 subclass 249]  249           Subclass 249 indent level is 3 Fluorine containing monomer contains at least one diverse halogen atom
[List of Patents for class 526 subclass 250]  250           Subclass 250 indent level is 3 Fluorine containing monomer contains F, C and H only or F and C only
[List of Patents for class 526 subclass 251]  251           Subclass 251 indent level is 4 Aromatic
[List of Patents for class 526 subclass 252]  252           Subclass 252 indent level is 4 Fluorine compound contains two or more ethylenic groups
[List of Patents for class 526 subclass 253]  253           Subclass 253 indent level is 4 Five or more fluorine atoms
[List of Patents for class 526 subclass 254]  254           Subclass 254 indent level is 5 Contains only carbon and fluorine atoms
[List of Patents for class 526 subclass 255]  255           Subclass 255 indent level is 4 Two or more fluorine atoms, e.g., vinylidene fluoride, etc.
[List of Patents for class 526 subclass 256]  256           Subclass 256 indent level is 2 From monomer containing sulfur atom as part of a heterocyclic ring
[List of Patents for class 526 subclass 257]  257           Subclass 257 indent level is 3 Sulfur-containing ring contains additional hetero atom, i.e., N, O, Se, Te
[List of Patents for class 526 subclass 258]  258           Subclass 258 indent level is 2 From monomer containing nitrogen atom as part of a heterocyclic ring
[List of Patents for class 526 subclass 259]  259           Subclass 259 indent level is 3 Nitrogen atom is part of a bridged or fused ring system
[List of Patents for class 526 subclass 260]  260           Subclass 260 indent level is 3 5- or 6-membered nitrogen ring compound having at least one oxygen in the ring
[List of Patents for class 526 subclass 261]  261           Subclass 261 indent level is 3 Three or more nitrogen atoms in a single ring
[List of Patents for class 526 subclass 262]  262           Subclass 262 indent level is 3 Imide monomer
[List of Patents for class 526 subclass 263]  263           Subclass 263 indent level is 3 Nitrogen of ring is bonded directly or indirectly to extracyclic ethylenic moiety
[List of Patents for class 526 subclass 264]  264           Subclass 264 indent level is 4 Lactam monomer
[List of Patents for class 526 subclass 265]  265           Subclass 265 indent level is 3 6-membered ring contains a single nitrogen atom
[List of Patents for class 526 subclass 266]  266           Subclass 266 indent level is 2 From monomer containing oxygen as part of a heterocyclic ring
[List of Patents for class 526 subclass 267]  267           Subclass 267 indent level is 3 Polymer contains coumarone and indene
[List of Patents for class 526 subclass 268]  268           Subclass 268 indent level is 3 From cyclic ether which is bridged or fused to a ring system
[List of Patents for class 526 subclass 269]  269           Subclass 269 indent level is 3 Hetero-oxygen ring compound contains a carbonate group, i.e., -O-C(=O)-O as ring atoms
[List of Patents for class 526 subclass 270]  270           Subclass 270 indent level is 3 5-membered heterocyclic ring compound contains at least one oxygen atom
[List of Patents for class 526 subclass 271]  271           Subclass 271 indent level is 4 Acid anhydride
[List of Patents for class 526 subclass 272]  272           Subclass 272 indent level is 5 Interpolymerized with hydrocarbon monomer
[List of Patents for class 526 subclass 273]  273           Subclass 273 indent level is 3 3-membered heterocyclic ring contains at least one oxygen atom
[List of Patents for class 526 subclass 274]  274           Subclass 274 indent level is 2 From monomer containing a phosphorus atom
[List of Patents for class 526 subclass 275]  275           Subclass 275 indent level is 3 Phosphorus is part of a ring
[List of Patents for class 526 subclass 276]  276           Subclass 276 indent level is 3 Phosphorus is bonded to a nitrogen atom
[List of Patents for class 526 subclass 277]  277           Subclass 277 indent level is 3 Phosphorus atom is pentavalent
[List of Patents for class 526 subclass 278]  278           Subclass 278 indent level is 4 Pentavalent phosphorus is bonded to at least one atom of carbon
[List of Patents for class 526 subclass 279]  279           Subclass 279 indent level is 2 From monomer containing a silicon atom
[List of Patents for class 526 subclass 280]  280           Subclass 280 indent level is 2 From fused or bridged ring containing monomer
[List of Patents for class 526 subclass 281]  281           Subclass 281 indent level is 3 Bridged monomer
[List of Patents for class 526 subclass 282]  282           Subclass 282 indent level is 4 Contains an exterior ethylenic substituent bonded to a single carbon atom of the bridged ring system
[List of Patents for class 526 subclass 283]  283           Subclass 283 indent level is 4 Compound containing dicyclopentadiene moiety
[List of Patents for class 526 subclass 284]  284           Subclass 284 indent level is 3 Contains an exterior ethylenic substituent bonded directly or indirectly to a single carbon atom of the fused ring system
[List of Patents for class 526 subclass 285]  285           Subclass 285 indent level is 2 From monomer containing an acetylenic group
[List of Patents for class 526 subclass 286]  286           Subclass 286 indent level is 2 From S-containing monomer
[List of Patents for class 526 subclass 287]  287           Subclass 287 indent level is 3 From monomer containing three or more oxygen atoms bonded to a single sulfur atom, e.g., sulfonate, etc.
[List of Patents for class 526 subclass 288]  288           Subclass 288 indent level is 3 From sulfur monomer containing nitrogen atom
[List of Patents for class 526 subclass 289]  289           Subclass 289 indent level is 3 From sulfide-containing monomer
[List of Patents for class 526 subclass 290]  290           Subclass 290 indent level is 2 Monomer from unsaturated petroleum hydrocarbon fraction; from unsaturated coal or bituminous material, extract, or derivative thereof; or from unsaturated fatty still residue
[List of Patents for class 526 subclass 291]  291           Subclass 291 indent level is 2 From halogen containing monomer having at least three carbon atoms
[List of Patents for class 526 subclass 292.1]  292.1           Subclass 292.1 indent level is 3 Halogen monomer is carboxylic acid ester
[List of Patents for class 526 subclass 292.2]  292.2           Subclass 292.2 indent level is 4 Contains nitrogen
[List of Patents for class 526 subclass 292.3]  292.3           Subclass 292.3 indent level is 4 Contains oxygen other than as part of a carboxylic acid ester group
[List of Patents for class 526 subclass 292.4]  292.4           Subclass 292.4 indent level is 4 Contains two or more carboxylic acid ester groups
[List of Patents for class 526 subclass 292.5]  292.5           Subclass 292.5 indent level is 4 Contains carbocyclic ring, e.g., aryl, etc.
[List of Patents for class 526 subclass 292.6]  292.6           Subclass 292.6 indent level is 4 Interpolymerized with a monomer containing atom other than carbon, hydrogen, or halogen
[List of Patents for class 526 subclass 292.7]  292.7           Subclass 292.7 indent level is 4 Interpolymerized
[List of Patents for class 526 subclass 292.8]  292.8           Subclass 292.8 indent level is 3 Halogen monomer is nitrile
[List of Patents for class 526 subclass 292.9]  292.9           Subclass 292.9 indent level is 3 Halogen monomer contains an ether group
[List of Patents for class 526 subclass 292.95]  292.95           Subclass 292.95 indent level is 3 Halogen monomer contains a carboxylic acid, salt, or carboxylic acid amide
[List of Patents for class 526 subclass 293]  293           Subclass 293 indent level is 3 Aromatic
[List of Patents for class 526 subclass 294]  294           Subclass 294 indent level is 3 Plural halogen atom
[List of Patents for class 526 subclass 295]  295           Subclass 295 indent level is 3 Plural ethylenic groups
[List of Patents for class 526 subclass 296]  296           Subclass 296 indent level is 2 From bromine or iodine containing monomer, dichloroethylene, trichloroethylene or tetrachloroethylene
[List of Patents for class 526 subclass 297]  297           Subclass 297 indent level is 2 From nitrile group containing monomer other than acrylonitrile or methacrylonitrile
[List of Patents for class 526 subclass 298]  298           Subclass 298 indent level is 3 Contains non-nitrile nitrogen atom or contains an oxygen atom
[List of Patents for class 526 subclass 299]  299           Subclass 299 indent level is 3 Aromatic
[List of Patents for class 526 subclass 300]  300           Subclass 300 indent level is 3 Plural nitrile group-containing
[List of Patents for class 526 subclass 301]  301           Subclass 301 indent level is 2 From monomer containing a >N-C(=O)-O- group, e.g., carbamic acid, etc.
[List of Patents for class 526 subclass 302]  302           Subclass 302 indent level is 2 From monomer containing a >>N-C(=O)-N<< or >>N-C(-O)-N<< group e.g., urea, isoureau, etc.
[List of Patents for class 526 subclass 303.1]  303.1           Subclass 303.1 indent level is 2 From carboxylic acid amide-containing monomer
[List of Patents for class 526 subclass 304]  304           Subclass 304 indent level is 3 Contains oxygen atom other than in amide form bonded to a carbon atom
[List of Patents for class 526 subclass 305]  305           Subclass 305 indent level is 3 Cycloaliphatic or aromatic
[List of Patents for class 526 subclass 306]  306           Subclass 306 indent level is 3 Plural amide group containing
[List of Patents for class 526 subclass 307]  307           Subclass 307 indent level is 3 Non-amide nitrogen containing
[List of Patents for class 526 subclass 307.1]  307.1           Subclass 307.1 indent level is 3 N- substituted unsaturated hydrocarbon group
[List of Patents for class 526 subclass 307.2]  307.2           Subclass 307.2 indent level is 3 With monomer containing carboxylic acid amide group
[List of Patents for class 526 subclass 307.3]  307.3           Subclass 307.3 indent level is 3 With monomer containing nitrogen other than (meth)-acrylonitrile
[List of Patents for class 526 subclass 307.4]  307.4           Subclass 307.4 indent level is 3 With monomer containing oxygen
[List of Patents for class 526 subclass 307.5]  307.5           Subclass 307.5 indent level is 4 Oxygen atom is part of ether or hydroxyl group
[List of Patents for class 526 subclass 307.6]  307.6           Subclass 307.6 indent level is 4 Oxygen atom is part of carboxylic acid group
[List of Patents for class 526 subclass 307.7]  307.7           Subclass 307.7 indent level is 4 Oxygen atom is part of ester group derived from unsaturated carboxylic acid
[List of Patents for class 526 subclass 307.8]  307.8           Subclass 307.8 indent level is 3 With hydrocarbon monomer
[List of Patents for class 526 subclass 308]  308           Subclass 308 indent level is 2 From cycloaliphatic monomer
[List of Patents for class 526 subclass 309]  309           Subclass 309 indent level is 3 Contains atoms other than carbon and hydrogen
[List of Patents for class 526 subclass 310]  310           Subclass 310 indent level is 2 From nitrogen containing monomer other than acrylonitrile or methacrylonitrile
[List of Patents for class 526 subclass 311]  311           Subclass 311 indent level is 3 Nitrogen bonded to oxygen atom (including nitrogen containing salts)
[List of Patents for class 526 subclass 312]  312           Subclass 312 indent level is 3 Contains oxygen atom bonded to a carbon atom
[List of Patents for class 526 subclass 313]  313           Subclass 313 indent level is 2 From phenol, phenol ether, or inorganic phenolate monomer
[List of Patents for class 526 subclass 314]  314           Subclass 314 indent level is 2 From monomer containing a carbonate group, i.e., -O-C(=O)-O-
[List of Patents for class 526 subclass 315]  315           Subclass 315 indent level is 2 From aldehyde monomer
[List of Patents for class 526 subclass 316]  316           Subclass 316 indent level is 2 From ketone or ketene monomer
[List of Patents for class 526 subclass 317.1]  317.1           Subclass 317.1 indent level is 2 From carboxylic acid monomer
[List of Patents for class 526 subclass 318]  318           Subclass 318 indent level is 3 Carboxylic acid contains ester group
[List of Patents for class 526 subclass 318.1]  318.1           Subclass 318.1 indent level is 3 Carboxylic acid contains aryl group, or two or more ethylenic groups
[List of Patents for class 526 subclass 318.2]  318.2           Subclass 318.2 indent level is 3 Carboxylic acid contains two or more carboxyl groups
[List of Patents for class 526 subclass 318.25]  318.25           Subclass 318.25 indent level is 4 With hydrocarbon, vinyl chloride or vinylidene chloride monomer
[List of Patents for class 526 subclass 318.3]  318.3           Subclass 318.3 indent level is 3 Carboxylic acid other than acrylic or methacrylic acid
[List of Patents for class 526 subclass 318.4]  318.4           Subclass 318.4 indent level is 3 With ester monomer
[List of Patents for class 526 subclass 318.41]  318.41           Subclass 318.41 indent level is 4 Monomer contains chalcogen other than in C(=O)-O- chalcogen in any monomer)
[List of Patents for class 526 subclass 318.42]  318.42           Subclass 318.42 indent level is 5 Hydroxyl group
[List of Patents for class 526 subclass 318.43]  318.43           Subclass 318.43 indent level is 4 Monomer contains two or more ester groups
[List of Patents for class 526 subclass 318.44]  318.44           Subclass 318.44 indent level is 4 Two or more ester monomers
[List of Patents for class 526 subclass 318.45]  318.45           Subclass 318.45 indent level is 4 With hydrocarbon monomer
[List of Patents for class 526 subclass 318.5]  318.5           Subclass 318.5 indent level is 3 With chalcogen containing monomer, e.g., additional carboxyl monomer, etc.
[List of Patents for class 526 subclass 318.6]  318.6           Subclass 318.6 indent level is 3 With hydrocarbon monomer
[List of Patents for class 526 subclass 319]  319           Subclass 319 indent level is 2 From carboxylic acid ester monomer
[List of Patents for class 526 subclass 320]  320           Subclass 320 indent level is 3 Ether or hydroxy containing
[List of Patents for class 526 subclass 321]  321           Subclass 321 indent level is 3 Monomer containing at least two carboxylic acid ester groups
[List of Patents for class 526 subclass 322]  322           Subclass 322 indent level is 4 Derived from an ethylenically unsaturated alcohol
[List of Patents for class 526 subclass 323]  323           Subclass 323 indent level is 5 Derived from an ethylenically unsaturated acid containing plural carboxylic acid groups
[List of Patents for class 526 subclass 323.1]  323.1           Subclass 323.1 indent level is 4 Diester derived from an ethylenically unsaturated monocarboxylic acid and polyol
[List of Patents for class 526 subclass 323.2]  323.2           Subclass 323.2 indent level is 5 With additional monomer
[List of Patents for class 526 subclass 324]  324           Subclass 324 indent level is 4 Interpolymerized with hydrocarbon monomer
[List of Patents for class 526 subclass 325]  325           Subclass 325 indent level is 4 Interpolymerized with monomer of diverse carboxylic ester
[List of Patents for class 526 subclass 326]  326           Subclass 326 indent level is 3 Aromatic
[List of Patents for class 526 subclass 327]  327           Subclass 327 indent level is 3 Derived from an ethylenically unsaturated carboxylic acid and an ethylenically unsaturated alcohol
[List of Patents for class 526 subclass 328]  328           Subclass 328 indent level is 3 Derived from an ethylenically unsaturated carboxylic acid
[List of Patents for class 526 subclass 328.5]  328.5           Subclass 328.5 indent level is 4 With additional monomer
[List of Patents for class 526 subclass 329]  329           Subclass 329 indent level is 5 Interpolymerized with hydrocarbon monomer
[List of Patents for class 526 subclass 329.1]  329.1           Subclass 329.1 indent level is 6 Hydrocarbon monomer containing at least two ethylenic groups, e.g., butadiene, etc.
[List of Patents for class 526 subclass 329.2]  329.2           Subclass 329.2 indent level is 6 Aromatic, e.g., styrene, etc.
[List of Patents for class 526 subclass 329.3]  329.3           Subclass 329.3 indent level is 5 Additional monomer is acrylonitrile or methacrylonitrile
[List of Patents for class 526 subclass 329.4]  329.4           Subclass 329.4 indent level is 5 Additional monomer is a halogen-containing monomer
[List of Patents for class 526 subclass 329.5]  329.5           Subclass 329.5 indent level is 5 Additional monomer is an ester derived from saturated carboxylic acid
[List of Patents for class 526 subclass 329.6]  329.6           Subclass 329.6 indent level is 5 Additional monomer contains an ether group
[List of Patents for class 526 subclass 329.7]  329.7           Subclass 329.7 indent level is 4 Polymer derived from methyl acrylate or methyl methacrylate
[List of Patents for class 526 subclass 330]  330           Subclass 330 indent level is 3 Interpolymer of an ester derived from ethylenically unsaturated alcohol, e.g., interpolymer of vinyl acetate, etc.
[List of Patents for class 526 subclass 331]  331           Subclass 331 indent level is 4 Interpolymerized with hydrocarbon monomer
[List of Patents for class 526 subclass 332]  332           Subclass 332 indent level is 2 From monomer containing an ether group
[List of Patents for class 526 subclass 333]  333           Subclass 333 indent level is 3 Plural ether groups
[List of Patents for class 526 subclass 334]  334           Subclass 334 indent level is 3 Aromatic or plural ethylenic groups
[List of Patents for class 526 subclass 335]  335           Subclass 335 indent level is 2 From hydrocarbon monomer containing at least two ethylenic groups, e.g., butadiene, etc.
[List of Patents for class 526 subclass 336]  336           Subclass 336 indent level is 3 Ethylenic groups are non-conjugated, e.g., divinylbenzene, etc.
[List of Patents for class 526 subclass 337]  337           Subclass 337 indent level is 3 Interpolymerized with at least one diverse hydrocarbon monomer containing at least two ethylenic groups
[List of Patents for class 526 subclass 338]  338           Subclass 338 indent level is 3 Interpolymerized with non-hydrocarbon monomer
[List of Patents for class 526 subclass 339]  339           Subclass 339 indent level is 3 Interpolymerized with aliphatic hydrocarbon
[List of Patents for class 526 subclass 340]  340           Subclass 340 indent level is 3 Interpolymerized with aromatic hydrocarbon
[List of Patents for class 526 subclass 340.1]  340.1           Subclass 340.1 indent level is 3 Polymerized in the presence of a water medium
[List of Patents for class 526 subclass 340.2]  340.2           Subclass 340.2 indent level is 3 From hydrocarbon having only five carbon atoms
[List of Patents for class 526 subclass 340.3]  340.3           Subclass 340.3 indent level is 3 From hydrocarbon having at least six carbon atoms
[List of Patents for class 526 subclass 340.4]  340.4           Subclass 340.4 indent level is 3 Butadiene homopolymer contains at least 75% cis-1,4-configuration
[List of Patents for class 526 subclass 341]  341           Subclass 341 indent level is 2 From acrylonitrile or methacrylonitrile
[List of Patents for class 526 subclass 342]  342           Subclass 342 indent level is 3 Interpolymerized
[List of Patents for class 526 subclass 343]  343           Subclass 343 indent level is 2 From vinylidene chloride
[List of Patents for class 526 subclass 344]  344           Subclass 344 indent level is 2 From vinyl chloride
[List of Patents for class 526 subclass 344.1]  344.1           Subclass 344.1 indent level is 3 Bulk or mass polymerization of vinyl chloride only
[List of Patents for class 526 subclass 344.2]  344.2           Subclass 344.2 indent level is 3 Polymerization of vinyl chloride only in an aqueous medium
[List of Patents for class 526 subclass 344.3]  344.3           Subclass 344.3 indent level is 3 Polyvinyl chloride characterized by physical shape, e.g., fiber, sheet, etc.
[List of Patents for class 526 subclass 345]  345           Subclass 345 indent level is 3 Interpolymerized
[List of Patents for class 526 subclass 346]  346           Subclass 346 indent level is 2 From aromatic hydrocarbon
[List of Patents for class 526 subclass 347]  347           Subclass 347 indent level is 3 Interpolymerized
[List of Patents for class 526 subclass 347.1]  347.1           Subclass 347.1 indent level is 3 Monomer other than styrene
[List of Patents for class 526 subclass 347.2]  347.2           Subclass 347.2 indent level is 3 Crystalline polystyrene
[List of Patents for class 526 subclass 348]  348           Subclass 348 indent level is 2 From hydrocarbon
[List of Patents for class 526 subclass 348.1]  348.1           Subclass 348.1 indent level is 3 Stretched product
[List of Patents for class 526 subclass 348.2]  348.2           Subclass 348.2 indent level is 3 At least six carbon atoms
[List of Patents for class 526 subclass 348.3]  348.3           Subclass 348.3 indent level is 4 Ten or more carbon atoms
[List of Patents for class 526 subclass 348.4]  348.4           Subclass 348.4 indent level is 4 Six carbon atoms only
[List of Patents for class 526 subclass 348.5]  348.5           Subclass 348.5 indent level is 5 N-hexene
[List of Patents for class 526 subclass 348.6]  348.6           Subclass 348.6 indent level is 3 At least four carbon atoms
[List of Patents for class 526 subclass 348.7]  348.7           Subclass 348.7 indent level is 4 Isobutylene
[List of Patents for class 526 subclass 348.8]  348.8           Subclass 348.8 indent level is 3 With nonhydrocarbon monomer
[List of Patents for class 526 subclass 351]  351           Subclass 351 indent level is 3 From propylene only
[List of Patents for class 526 subclass 352]  352           Subclass 352 indent level is 3 From ethylene only
[List of Patents for class 526 subclass 352.2]  352.2           Subclass 352.2 indent level is 4 Low density
 
CROSS-REFERENCE ART COLLECTIONS
 
[List of Patents for class 526 subclass 901]  901           MONOMER POLYMERIZED IN VAPOR STATE IN PRESENCE OF TRANSITION METAL CONTAINING CATALYST
[List of Patents for class 526 subclass 902]  902           MONOMER POLYMERIZED IN BULK IN PRESENCE OF TRANSITION METAL CONTAINING CATALYST
[List of Patents for class 526 subclass 903]  903           MONOMER POLYMERIZED IN PRESENCE OF TRANSITION METAL CONTAINING CATALYST AND HYDROCARBON ADDITIVE AFFECTING POLYMER PROPERTIES OF CATALYST ACTIVITY
[List of Patents for class 526 subclass 904]  904           MONOMER POLYMERIZED IN PRESENCE OF TRANSITION METAL CONTAINING CATALYST AT LEAST PART OF WHICH IS SUPPORTED ON A POLYMER; E.G., PREPOLYMERIZED CATALYSTS, ETC.
[List of Patents for class 526 subclass 905]  905           POLYMERIZATION IN PRESENCE OF TRANSITION METAL CONTAINING CATALYST IN PRESENCE OF HYDROGEN
[List of Patents for class 526 subclass 906]  906           COMMINUTION OF TRANSITION METAL CONTAINING CATALYST
[List of Patents for class 526 subclass 907]  907           SPECIFIED MEANS OF REACTING COMPONENTS OF TRANSITION METAL CATALYST
[List of Patents for class 526 subclass 908]  908           CONTAINING CATALYST OF SPECIFIED PARTICLE SIZE
[List of Patents for class 526 subclass 909]  909           POLYMERIZATION CHARACTERIZED BY PARTICLE SIZE OF PRODUCT
[List of Patents for class 526 subclass 910]  910           SUSPENDING AGENTS
[List of Patents for class 526 subclass 911]  911           EMULSIFYING AGENTS
[List of Patents for class 526 subclass 912]  912           REACTION MEDIUM PURIFICATION
[List of Patents for class 526 subclass 913]  913           VAPOR PHASE POLYMERIZATION IN ABSENCE OF TRANSITION METAL CONTAINING CATALYST
[List of Patents for class 526 subclass 914]  914           POLYMER DEGRADATION
[List of Patents for class 526 subclass 915]  915           REDOX CATALYST
[List of Patents for class 526 subclass 916]  916           INTERPOLYMER FROM AT LEAST THREE ETHYLENICALLY UNSATURATED MONOOLEFINIC HYDROCARBON MONOMERS
[List of Patents for class 526 subclass 917]  917           MANIPULATIVE PROCESSES INVOLVING A SULFUR-CONTAINING TREATING AGENT
[List of Patents for class 526 subclass 918]  918           POLYMERIZATION REACTORS FOR ADDITION POLYMER PREPARATION
[List of Patents for class 526 subclass 919]  919           CATALYST INJECTION TECHNIQUE IN ADDITION POLYMERIZATION PROCESSES
[List of Patents for class 526 subclass 920]  920           APPARATUS FOR USE IN ADDITION POLYMERIZATION PROCESSES
[List of Patents for class 526 subclass 921]  921           TIME CYCLE USED IN ADDITION POLYMERIZATION PROCESS CONTROL
[List of Patents for class 526 subclass 922]  922           POLYMERIZATION PROCESS OF ETHYLENIC MONOMERS USING MANIPULATIVE TECHNIQUE
[List of Patents for class 526 subclass 923]  923           ETHYLENIC MONOMERS CONTAINING AT LEAST ONE SALT GROUP
[List of Patents for class 526 subclass 930]  930           WATER SWELLABLE OR HYDROPHILIC
[List of Patents for class 526 subclass 931]  931           PRESSURE SENSITIVE ADHESIVE
[List of Patents for class 526 subclass 932]  932           THICKENER OR DISPERSANT FOR AQUEOUS SYSTEM
[List of Patents for class 526 subclass 933]  933           DETERGENT PROPERTY OR LUBRICANT ADDITIVE
[List of Patents for class 526 subclass 934]  934           ELECTRODEPOSIT, E.G., ELECTROPHORETIC, XEROGRAPHIC, ETC.
[List of Patents for class 526 subclass 935]  935           HOT MELT ADHESIVE
[List of Patents for class 526 subclass 936]  936           PHYSIOLOGICAL USE, E.G., PHARMACEUTICAL, VETERINARY, DENTAL, ETC.
[List of Patents for class 526 subclass 937]  937           OPTICAL CLARITY
[List of Patents for class 526 subclass 938]  938           RUBBERY PROPERTY
[List of Patents for class 526 subclass 939]  939           MOSITURE PROOF OR HYDROPHOBIC
[List of Patents for class 526 subclass 940]  940           HIGH SOFTENING TEMPERATURE, E.G., EXPOSURE TO BOILING WATER, BOILABLE, ETC.
[List of Patents for class 526 subclass 941]  941           HAVING THE TRANSITION METAL BONDED DIRECTLY TO CARBON
[List of Patents for class 526 subclass 942]  942           POLYMERIZATION IN THE PRESENCE OF A LIQUID CO2 DILUENT
[List of Patents for class 526 subclass 943]  943           POLYMERIZATION WITH METALLOCENE CATALYSTS
 
FOREIGN ART COLLECTIONS
 
   FOR000          CLASS-RELATED FOREIGN DOCUMENTS

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