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[Search a list of Patent Appplications for class 528]  Class   528SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES
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This Class 528 is considered to be an integral part of Class 520 (see the Class 520 schedule for the position of this Class in schedule hierarchy). This Class retains all pertinent definitions and class lines of Class 520
              SYNTHETIC RESINS (CLASS 520, SUBCLASS 1)
[List of Patents for class 528 subclass 1]  1           Subclass 1 indent level is 1 FROM PLANT MATERIAL OF UNKNOWN CONSTITUTION
[List of Patents for class 528 subclass 2]  2           Subclass 2 indent level is 2 From cashew material with a sulfur-containing reactant
[List of Patents for class 528 subclass 3]  3           Subclass 3 indent level is 2 From cashew material with an aldehyde or derivative
[List of Patents for class 528 subclass 4]  4           Subclass 4 indent level is 1 FROM BORON REACTANT HAVING AT LEAST ONE BORON TO HYDROGEN OR BORON TO CARBON BOND
[List of Patents for class 528 subclass 5]  5           Subclass 5 indent level is 2 Boron reactant contains a silicon atom
[List of Patents for class 528 subclass 6]  6           Subclass 6 indent level is 2 Boron reactant contains a phosphorus atom
[List of Patents for class 528 subclass 7]  7           Subclass 7 indent level is 2 Boron reactant contains a nitrogen atom
[List of Patents for class 528 subclass 8]  8           Subclass 8 indent level is 2 Boron reactant contains a boron atom bonded to at least one atom of oxygen
[List of Patents for class 528 subclass 9]  9           Subclass 9 indent level is 1 FROM HEAVY METAL OR ALUMINUM REACTANT HAVING AT LEAST ONE HYDROGEN-TO-HEAVY METAL OR -ALUMINUM BOND OR AT LEAST ONE CARBON-TO-HEAVY METAL OR -ALUMINUM BOND
[List of Patents for class 528 subclass 10]  10           Subclass 10 indent level is 1 FROM SILICON REACTANT HAVING AT LEAST ONE SILICON-TO-HYDROGEN OR -CARBON BOND
[List of Patents for class 528 subclass 12]  12           Subclass 12 indent level is 2 Polymerizing in the pressence of a specified material other than a reactant
[List of Patents for class 528 subclass 13]  13           Subclass 13 indent level is 3 Material is a boron-containing material
[List of Patents for class 528 subclass 14]  14           Subclass 14 indent level is 3 Material is a metal-containing material
[List of Patents for class 528 subclass 15]  15           Subclass 15 indent level is 4 Material contains a Group VIII metal atom
[List of Patents for class 528 subclass 16]  16           Subclass 16 indent level is 4 Material contains a Group IIIA metal
[List of Patents for class 528 subclass 17]  17           Subclass 17 indent level is 4 Material contains a Group IVB metal atom
[List of Patents for class 528 subclass 18]  18           Subclass 18 indent level is 4 Material contains a Group IVA metal atom
[List of Patents for class 528 subclass 19]  19           Subclass 19 indent level is 4 Material contains a heavy metal atom
[List of Patents for class 528 subclass 20]  20           Subclass 20 indent level is 3 Material contains an alcohol, alcoholate, or ether compound
[List of Patents for class 528 subclass 21]  21           Subclass 21 indent level is 3 Material is a nitrogen-containing compound
[List of Patents for class 528 subclass 22]  22           Subclass 22 indent level is 4 Nitrogen-containign silicon compound
[List of Patents for class 528 subclass 23]  23           Subclass 23 indent level is 3 Material contains a phosphorus or sulfur atom
[List of Patents for class 528 subclass 24]  24           Subclass 24 indent level is 3 Material contains a compound having an O-O group, e.g., peroxide, etc.
[List of Patents for class 528 subclass 25]  25           Subclass 25 indent level is 2 With organic silicon-free reactant
[List of Patents for class 528 subclass 26]  26           Subclass 26 indent level is 3 Organic Si-free reactant is a carboxylic acid or derivative
[List of Patents for class 528 subclass 26.5]  26.5           Subclass 26.5 indent level is 4 Reactant which is a fatty acid glycerol ester, a fatty acid or salt derived from a naturally occurring glyceride, tall oil, or a fatty acid derived from tall oil
[List of Patents for class 528 subclass 27]  27           Subclass 27 indent level is 3 Organic Si-free reactant contains a heterocyclic ring
[List of Patents for class 528 subclass 28]  28           Subclass 28 indent level is 3 Organic Si-free reactant is a nitrogen-containing compound
[List of Patents for class 528 subclass 29]  29           Subclass 29 indent level is 3 Organic Si-free reactant is an alcohol or alcoholate
[List of Patents for class 528 subclass 30]  30           Subclass 30 indent level is 2 From silicon-containing reactant having at least one polyvalent atom other than carbon, oxygen, or nitrogen
[List of Patents for class 528 subclass 31]  31           Subclass 31 indent level is 2 Silicon reactant contains a silicon-to-hydrogen bond
[List of Patents for class 528 subclass 32]  32           Subclass 32 indent level is 2 Silicon reactant contains an ethylenically unsaturated group
[List of Patents for class 528 subclass 33]  33           Subclass 33 indent level is 2 Silicon reactant contains two or more silicon atoms
[List of Patents for class 528 subclass 34]  34           Subclass 34 indent level is 3 With silicon reactant containing a single silicon atom
[List of Patents for class 528 subclass 35]  35           Subclass 35 indent level is 3 Silicon reactamt contains only carbon atom, only a carbon chain, or chain of carbon and oxygen atoms only between two silicon atoms
[List of Patents for class 528 subclass 36]  36           Subclass 36 indent level is 3 Silicon reactant contains at least one halogen atom bonded to a carbon atom which carbon atom is not an acyl halide carbon atom
[List of Patents for class 528 subclass 37]  37           Subclass 37 indent level is 3 Reactant contains a silicon atom as a ring member of a cyclic compound
[List of Patents for class 528 subclass 38]  38           Subclass 38 indent level is 2 Silicon reactant contains an amine nitrogen atom
[List of Patents for class 528 subclass 39]  39           Subclass 39 indent level is 2 With silicon reactant which is free of any silicon to carbon bond
[List of Patents for class 528 subclass 40]  40           Subclass 40 indent level is 2 Silicon reactant contains a fused, bridged, or cycloaliphatic ring
[List of Patents for class 528 subclass 41]  41           Subclass 41 indent level is 2 Silicon containing carboxylic acid or derivative or from a silicon derivative of a nonsilicon containing carboxylic acid
[List of Patents for class 528 subclass 42]  42           Subclass 42 indent level is 2 Silicon reactant contains at least one halogen atom bonded to a carbon atom which carbon atom is not an acyl halide carbon atom
[List of Patents for class 528 subclass 43]  43           Subclass 43 indent level is 2 Silicon reactant contains an aryl group
[List of Patents for class 528 subclass 44]  44           Subclass 44 indent level is 1 FROM REACTANT HAVING AT LEAST ONE -N=C=X GROUP (WHEREIN X IS A CHALCOGEN ATOM) AS WELL AS PRECURSORS THEREOF, E.G., BLOCKED ISOCYANATE, ETC.
[List of Patents for class 528 subclass 45]  45           Subclass 45 indent level is 2 From at least one blocked -N=C=X group
[List of Patents for class 528 subclass 48]  48           Subclass 48 indent level is 2 Process of polymerizing in the presence of a specified material other than reactant
[List of Patents for class 528 subclass 49]  49           Subclass 49 indent level is 3 Material contains only one -C-XH,-C-C(=X)-XH or carbon to -NH or HNH group
[List of Patents for class 528 subclass 50]  50           Subclass 50 indent level is 3 Material contains compound having a -O-O- group, e.g., peroxide, etc.
[List of Patents for class 528 subclass 51]  51           Subclass 51 indent level is 3 Material contains a phosphorus atom
[List of Patents for class 528 subclass 52]  52           Subclass 52 indent level is 3 Material is organic nitrogen-containing compoud
[List of Patents for class 528 subclass 53]  53           Subclass 53 indent level is 4 Organic nitrogen compound contains a nitrogen atom bonded to three atoms or carbon
[List of Patents for class 528 subclass 54]  54           Subclass 54 indent level is 5 Nitrogen compound wherein nitrogen atom is bonded to three atoms of carbon contains a bridged- or fused-ring system, e.g., triethylene diamine, etc.
[List of Patents for class 528 subclass 55]  55           Subclass 55 indent level is 3 Material contains at least one metal atom
[List of Patents for class 528 subclass 56]  56           Subclass 56 indent level is 4 Material contains a transition metal atom
[List of Patents for class 528 subclass 57]  57           Subclass 57 indent level is 4 Material contains at least one group IA or group IIA metal atom
[List of Patents for class 528 subclass 58]  58           Subclass 58 indent level is 4 Material contains at least one atom of tin
[List of Patents for class 528 subclass 59]  59           Subclass 59 indent level is 2 From N=C=X reactant having at least two -C-NH-C(=X)- groups
[List of Patents for class 528 subclass 60]  60           Subclass 60 indent level is 3 With reactant compound containing three or more XH, -C(=X)-XH, -NH, =NH, or HNH groups or combination thereof
[List of Patents for class 528 subclass 61]  61           Subclass 61 indent level is 3 With organic nitrogen reactant which contains two NH, =NH, or HNH groups
[List of Patents for class 528 subclass 62]  62           Subclass 62 indent level is 4 Organic NH, =NH, or HNH nitrogen-containing reactant contains a heterocyclic ring
[List of Patents for class 528 subclass 63]  63           Subclass 63 indent level is 4 Organic NH, =NH, HNH nitrogen reactant contains at least one halogen atom
[List of Patents for class 528 subclass 64]  64           Subclass 64 indent level is 4 Organic NH, =NH or HNH nitrogen reactant contains a carbocyclic or aromatic ring
[List of Patents for class 528 subclass 65]  65           Subclass 65 indent level is 3 With reactant having two -XH groups
[List of Patents for class 528 subclass 66]  66           Subclass 66 indent level is 4 Reactant having two -XH groups contains two or more -C-X-C- groups or two or more carboxylic acid ester groups
[List of Patents for class 528 subclass 67]  67           Subclass 67 indent level is 2 From two or more reactants containing -N=C=X groups
[List of Patents for class 528 subclass 68]  68           Subclass 68 indent level is 2 With organic compound reactant containing at least two NH, HNH or =NH groups and wherein the reactant composition is devoid of -C-XH, -C(=X)XH or anhydride
[List of Patents for class 528 subclass 69]  69           Subclass 69 indent level is 2 Reactant contains a single -N=C=X group
[List of Patents for class 528 subclass 70]  70           Subclass 70 indent level is 2 Reactant contains a fluorine atom
[List of Patents for class 528 subclass 71]  71           Subclass 71 indent level is 2 Reactant contains at least one salt group, e.g., quaternary ammonium salt, etc.
[List of Patents for class 528 subclass 72]  72           Subclass 72 indent level is 2 Reactant contains at least one phosphorus atom
[List of Patents for class 528 subclass 73]  73           Subclass 73 indent level is 2 Reactant contains at least one heterocyclic ring
[List of Patents for class 528 subclass 74]  74           Subclass 74 indent level is 2 Reactant contains at least one bridged- or fused-ring system
[List of Patents for class 528 subclass 74.5]  74.5           Subclass 74.5 indent level is 2 Reactant which is a fatty acid glycerol ester, a fatty acid or salt derived from a naturally occurring glyceride, tall oil, or a fatty acid derived from tall oil
[List of Patents for class 528 subclass 75]  75           Subclass 75 indent level is 2 Reactant contains at least one ethylenically unsaturated group
[List of Patents for class 528 subclass 76]  76           Subclass 76 indent level is 2 With ether or thioether compound containing at least two -C-X-C- groups
[List of Patents for class 528 subclass 77]  77           Subclass 77 indent level is 3 Ether or thioether compound contains three or more -XH groups
[List of Patents for class 528 subclass 78]  78           Subclass 78 indent level is 3 Ether or thioether contains at least one nitrogen atom other than as a C NH, C=NH, or C-N(H)-H
[List of Patents for class 528 subclass 79]  79           Subclass 79 indent level is 3 Ether or thioether contains a carbocyclic or aromatic group
[List of Patents for class 528 subclass 80]  80           Subclass 80 indent level is 2 With reactant compound containing at least two -C-C(=X)-X-C groups and which compound is devoid of C-NH, C=NH or C-N(H)-H groups
[List of Patents for class 528 subclass 81]  81           Subclass 81 indent level is 3 Reactant compound which contains at least two -C-C(=X)-X-C groups contains three or more XH groups
[List of Patents for class 528 subclass 82]  82           Subclass 82 indent level is 3 Reactant which contains at least two -C-C(=X)-X-C groups contains tertiary nitrogen atom
[List of Patents for class 528 subclass 83]  83           Subclass 83 indent level is 3 Reactant which contains at least two -C-C(=X)-X-C groups has been derived from only a dicarboxylic acid or derivative and only a dihydric alcohol or alcoholate derivative
[List of Patents for class 528 subclass 84]  84           Subclass 84 indent level is 2 With reactant containing at least two -C-C(=X)-X groups
[List of Patents for class 528 subclass 85]  85           Subclass 85 indent level is 2 With reactant containing at least two -XH groups
[List of Patents for class 528 subclass 86]  86           Subclass 86 indent level is 1 FROM PHENOL, PHENOL ETHER, OR INORGANIC PHENOLATE
[List of Patents for class 528 subclass 87]  87           Subclass 87 indent level is 2 From 1,2-epoxy-containing phenolic reactant or with 1,2-epoxy-containing reactant
[List of Patents for class 528 subclass 88]  88           Subclass 88 indent level is 3 Polymerizing in the presence of a specified material other than reactant
[List of Patents for class 528 subclass 89]  89           Subclass 89 indent level is 4 Material contains a phosphorus atom
[List of Patents for class 528 subclass 90]  90           Subclass 90 indent level is 4 Material contains a sulfur atom
[List of Patents for class 528 subclass 91]  91           Subclass 91 indent level is 4 Material contains a boron atom
[List of Patents for class 528 subclass 92]  92           Subclass 92 indent level is 4 Material contains a polyvalent metal atom
[List of Patents for class 528 subclass 93]  93           Subclass 93 indent level is 4 Material contains a nitrogen compound
[List of Patents for class 528 subclass 94]  94           Subclass 94 indent level is 5 Nitrogen material contains a nitrogen atom as part of a heterocyclic ring
[List of Patents for class 528 subclass 95]  95           Subclass 95 indent level is 4 Material contains a Group IA metal atom (Li, Na, K, Rb, Cs, Fr)
[List of Patents for class 528 subclass 96]  96           Subclass 96 indent level is 3 Phenolic reactant contains a heterocyclic group other than a 1,2-epoxy group per se
[List of Patents for class 528 subclass 97]  97           Subclass 97 indent level is 3 Phenolic reactant contains a fused-or bridged-ring other than as a 1,2 epoxy group fused to carbocyclic or aromatic ring
[List of Patents for class 528 subclass 98]  98           Subclass 98 indent level is 3 Phenolic reactant contains at least three distinct aromatic or carbocyclic rings or mixtures thereof
[List of Patents for class 528 subclass 99]  99           Subclass 99 indent level is 3 Phenolic reactant contains at least one nitrogen, phosphorus, or sulfur atom
[List of Patents for class 528 subclass 100]  100           Subclass 100 indent level is 3 Phenolic reactant contains a carboxylic acid or carboxylic acid derivative thereof
[List of Patents for class 528 subclass 101]  101           Subclass 101 indent level is 3 Phenolic reactant contains ethylenic unsaturation or contains a 1,2-epoxy group fused to a carbocyclic ring
[List of Patents for class 528 subclass 102]  102           Subclass 102 indent level is 3 Phenolic reactant contains a halogen atom directly bonded to a nuclear carbon atom of the aryl-oxygen group
[List of Patents for class 528 subclass 103]  103           Subclass 103 indent level is 3 Two or more 1,2-epoxy reactants
[List of Patents for class 528 subclass 103.5]  103.5           Subclass 103.5 indent level is 4 1,2-epoxy reactant having at least one carboxylic ester group, e.g., epoxidized linseed oil, etc.
[List of Patents for class 528 subclass 104]  104           Subclass 104 indent level is 3 Two or more phenolic reactants
[List of Patents for class 528 subclass 105]  105           Subclass 105 indent level is 3 Phenolic reactant contains only one, 1,2-epoxy group
[List of Patents for class 528 subclass 106]  106           Subclass 106 indent level is 3 With at least one nonepoxy or nonphenolic reactant
[List of Patents for class 528 subclass 107]  107           Subclass 107 indent level is 4 Non-1,2-epoxy or nonphenolic reactant is an aldehyde or derivative
[List of Patents for class 528 subclass 108]  108           Subclass 108 indent level is 4 Non-1,2-epoxy, or nonphenolic reactant is a phosphorus-containing material
[List of Patents for class 528 subclass 109]  109           Subclass 109 indent level is 4 Non-1,2-epoxy, or nonphenolic reactant is a sulfur-containing material
[List of Patents for class 528 subclass 110]  110           Subclass 110 indent level is 4 Non-1,2-epoxy, or nonphenolic reactant is an alcohol, inorganic alcoholate, or ether
[List of Patents for class 528 subclass 111]  111           Subclass 111 indent level is 5 Nitrogen-containing alcohol, inorganic alcoholate, or ether
[List of Patents for class 528 subclass 111.3]  111.3           Subclass 111.3 indent level is 4 Non 1,2-epoxy or nonphenolic reactant which is a dimer or trimer of an ethylenically unsaturated aliphatic monocarboxylic acid having at least ten carbon atoms; or adduct of said unsaturated monocarboxylic acid with an alpha, beta ethylenically unsaturated carboxylic acid or derivative
[List of Patents for class 528 subclass 111.5]  111.5           Subclass 111.5 indent level is 4 Non 1,2-epoxy or nonphenolic reactant which is a fatty acid glycerol ester, a fatty acid or salt derived from a naturally occurring glyceride, tall oil, or a fatty acid derived from tall oil
[List of Patents for class 528 subclass 112]  112           Subclass 112 indent level is 4 Non-1,2-epoxy or nonphenolic reactant is a carboxylic acid, salt thereof, or carboxylic acid anhydride
[List of Patents for class 528 subclass 113]  113           Subclass 113 indent level is 5 With nitrogen-containing reactant
[List of Patents for class 528 subclass 114]  114           Subclass 114 indent level is 5 Nitrogen-containing carboxylic acid, salt thereof, or anhydride, or nitrogen-containing salt of a non-nitrogen-containing carboxylic acid
[List of Patents for class 528 subclass 115]  115           Subclass 115 indent level is 5 At least two carboxylic acids, salts thereof, or carboxylic acid anhydrides, or mixtures thereof
[List of Patents for class 528 subclass 116]  116           Subclass 116 indent level is 4 Non-1,2-epoxy or nonphenolic reactant contains a heterocyclic ring
[List of Patents for class 528 subclass 117]  117           Subclass 117 indent level is 5 Five-membered heterocyclic ring contains at least one nitrogen atom as a ring member
[List of Patents for class 528 subclass 118]  118           Subclass 118 indent level is 5 Six-membered heterocyclic ring contains at least one nitrogen atom as a ring member
[List of Patents for class 528 subclass 119]  119           Subclass 119 indent level is 4 Non-1,2-epoxy or nonphenolic reactant contains one or more nitrogen atoms
[List of Patents for class 528 subclass 120]  120           Subclass 120 indent level is 5 Two or more nitrogen-containing reactants
[List of Patents for class 528 subclass 121]  121           Subclass 121 indent level is 5 Nitrogen reactant contains at least one amino-nitrogen atom
[List of Patents for class 528 subclass 122]  122           Subclass 122 indent level is 6 Nitrogen reactant having at least one amino-nitrogen atom contains a cycloaliphatic ring
[List of Patents for class 528 subclass 123]  123           Subclass 123 indent level is 6 Nitrogen reactant having at least one amino-nitrogen atom contains three or more nitrogen atoms
[List of Patents for class 528 subclass 124]  124           Subclass 124 indent level is 6 Nitrogen reactant having at least one amino-nitrogen atom contains at least one aryl group
[List of Patents for class 528 subclass 125]  125           Subclass 125 indent level is 2 From ketone-containing phenolic reactant or with ketone-containing reactant
[List of Patents for class 528 subclass 126]  126           Subclass 126 indent level is 3 Polymerizing in the presence of a specified material other than reactant
[List of Patents for class 528 subclass 127]  127           Subclass 127 indent level is 3 With nonketone- or nonphenolic-aldehyde or derivative as a reactant
[List of Patents for class 528 subclass 128]  128           Subclass 128 indent level is 3 With nonphenolic or nonketone reactant
[List of Patents for class 528 subclass 129]  129           Subclass 129 indent level is 2 With aldehyde or derivative
[List of Patents for class 528 subclass 137]  137           Subclass 137 indent level is 3 Polymerizing in the presence of a specified material other than a reactant
[List of Patents for class 528 subclass 138]  138           Subclass 138 indent level is 4 Material contains a boron atom
[List of Patents for class 528 subclass 139]  139           Subclass 139 indent level is 4 Material contains an aluminum or heavy metal atom
[List of Patents for class 528 subclass 140]  140           Subclass 140 indent level is 4 Material contains a Group IIA metal atom (Be, Mg, Ca, Sr, Ba, Ra)
[List of Patents for class 528 subclass 141]  141           Subclass 141 indent level is 4 Material contains a phosphorus atom
[List of Patents for class 528 subclass 142]  142           Subclass 142 indent level is 4 Material contains an alcohol, inorganic alcoholate, or ether
[List of Patents for class 528 subclass 143]  143           Subclass 143 indent level is 4 Material contains a sulfur atom
[List of Patents for class 528 subclass 144]  144           Subclass 144 indent level is 4 Material contains a carboxylic acid, anhydride thereof, ester thereof, or salt thereof
[List of Patents for class 528 subclass 145]  145           Subclass 145 indent level is 4 Material contains a nitrogen compound
[List of Patents for class 528 subclass 146]  146           Subclass 146 indent level is 5 Nitrogen-containing material contains a nitrogen atom directly bonded to a carbon atom
[List of Patents for class 528 subclass 147]  147           Subclass 147 indent level is 4 Material contains a Group IA metal atom (Li, Na, K, Rb, Cs, Fr)
[List of Patents for class 528 subclass 148]  148           Subclass 148 indent level is 3 Phenolic reactant contains a carboxylic acid or carboxylic acid salt group
[List of Patents for class 528 subclass 149]  149           Subclass 149 indent level is 3 Phenolic reactant contains a nitrogen atom
[List of Patents for class 528 subclass 150]  150           Subclass 150 indent level is 3 Phenolic reactant contains a sulfur atom
[List of Patents for class 528 subclass 151]  151           Subclass 151 indent level is 3 Phenolic reactant contains a halogen atom directly bonded to a nuclear carbon atom of the benzene-oxygen group
[List of Patents for class 528 subclass 152]  152           Subclass 152 indent level is 3 Phenolic reactant contains an ethylenically unsaturated group
[List of Patents for class 528 subclass 153]  153           Subclass 153 indent level is 3 Phenolic reactant contains at least two ring moieties (includes fused or bridged ring system)
[List of Patents for class 528 subclass 154]  154           Subclass 154 indent level is 3 Phenol ether
[List of Patents for class 528 subclass 155]  155           Subclass 155 indent level is 3 Two distinct phenolic reactants or two or more hydroxy groups or phenate groups bonded to nuclear carbon atoms of the same benzene ring
[List of Patents for class 528 subclass 156]  156           Subclass 156 indent level is 3 Two or more aldehydes or derivatives
[List of Patents for class 528 subclass 157]  157           Subclass 157 indent level is 3 Aldehyde or derivative is ethylenically unsaturated
[List of Patents for class 528 subclass 158]  158           Subclass 158 indent level is 3 With at least one nonaldehyde phosphorus- or sulfur-containing reactant
[List of Patents for class 528 subclass 158.5]  158.5           Subclass 158.5 indent level is 3 With a reactant which is a fatty acid glycerol ester, a fatty acid or salt derived from a naturally occurring glyceride, tall oil, or a fatty acid derived from tall oil
[List of Patents for class 528 subclass 159]  159           Subclass 159 indent level is 3 With an ethylenically unsaturated reactant
[List of Patents for class 528 subclass 160]  160           Subclass 160 indent level is 3 With reactant having only carbon and hydrogen atoms or only carbon, hydrogen, and halogen atoms
[List of Patents for class 528 subclass 161]  161           Subclass 161 indent level is 3 With at least one reactant which is other than an aldehyde or derivative and which contains a carboxylic acid, anhydride thereof, salt thereof, or ester thereof
[List of Patents for class 528 subclass 162]  162           Subclass 162 indent level is 3 With nitrogen-containing reactant
[List of Patents for class 528 subclass 163]  163           Subclass 163 indent level is 4 Nitrogen-containing reactant is a heterocyclic ring compound containing at least one nitrogen atom as a ring member or is nitrogen-containing aromatic compound
[List of Patents for class 528 subclass 164]  164           Subclass 164 indent level is 4 Nitrogen-containing reactant contains the -N-C(=O)-N- group
[List of Patents for class 528 subclass 165]  165           Subclass 165 indent level is 3 Aldehyde or derivative is sole coreactant
[List of Patents for class 528 subclass 166]  166           Subclass 166 indent level is 2 Aluminum- or heavy metal-containing reactant
[List of Patents for class 528 subclass 167]  167           Subclass 167 indent level is 2 Phosphorus-containing reactant
[List of Patents for class 528 subclass 168]  168           Subclass 168 indent level is 3 Nitrogen-containing reactant
[List of Patents for class 528 subclass 169]  169           Subclass 169 indent level is 3 Halogen-containing reactant
[List of Patents for class 528 subclass 170]  170           Subclass 170 indent level is 2 Imide-containing reactant
[List of Patents for class 528 subclass 171]  171           Subclass 171 indent level is 2 Sulfur reactant contains sulfur directly bonded to oxygen
[List of Patents for class 528 subclass 172]  172           Subclass 172 indent level is 3 Nitrogen-containing compound is a reactant other than wherein nitrogen is solely present as a carboxylic acid derivative
[List of Patents for class 528 subclass 173]  173           Subclass 173 indent level is 3 Carboxylic acid or derivative is a reactant
[List of Patents for class 528 subclass 174]  174           Subclass 174 indent level is 3 Halogen-containing material is a reactant
[List of Patents for class 528 subclass 175]  175           Subclass 175 indent level is 4 Reactant contains a (O=)S(=O)-halo group
[List of Patents for class 528 subclass 176]  176           Subclass 176 indent level is 2 With polycarboxylic acid or derivative as reactant
[List of Patents for class 528 subclass 179]  179           Subclass 179 indent level is 3 Polymerizing in the presence of a specified material other than a reactant and other than Group IA or Group IIA material as sole metal atom
[List of Patents for class 528 subclass 180]  180           Subclass 180 indent level is 4 Material contains a metal atom
[List of Patents for class 528 subclass 181]  181           Subclass 181 indent level is 5 At least one transition metal atom
[List of Patents for class 528 subclass 182]  182           Subclass 182 indent level is 4 Material is a nitrogen-containing compound
[List of Patents for class 528 subclass 183]  183           Subclass 183 indent level is 3 Nitrogen reactant contains at least one amino-nitrogen atom
[List of Patents for class 528 subclass 184]  184           Subclass 184 indent level is 4 Nitrogen reactant having at least one amino-nitrogen atom contains a carboxylic acid group or is a derivative thereof
[List of Patents for class 528 subclass 185]  185           Subclass 185 indent level is 4 Phenolic reactant contains at least two aryl rings and two diverse phenolic to oxygen bonds
[List of Patents for class 528 subclass 186]  186           Subclass 186 indent level is 4 Nitrogen reactant contains at least three amino-nitrogen atoms bonded to one or more carbon atoms
[List of Patents for class 528 subclass 187]  187           Subclass 187 indent level is 5 At least one reactant contains three or more carboxylic acid groups or is derivative thereof
[List of Patents for class 528 subclass 188]  188           Subclass 188 indent level is 4 Reactant contains three or more carboxylic acid groups or is derivative thereof
[List of Patents for class 528 subclass 189]  189           Subclass 189 indent level is 5 Two or more polycarboxylic acids or derivatives or mixtures thereof
[List of Patents for class 528 subclass 190]  190           Subclass 190 indent level is 3 Reactant contains a fused- or bridged-ring other than solely as a polycarboxylic acid anhydride group
[List of Patents for class 528 subclass 191]  191           Subclass 191 indent level is 3 Reactant contains a halogen atom other than solely as halogen atom bonded to a carbonyl group
[List of Patents for class 528 subclass 192]  192           Subclass 192 indent level is 3 Ethylenically unsaturated reactant
[List of Patents for class 528 subclass 193]  193           Subclass 193 indent level is 3 Two or more phenolic reactants
[List of Patents for class 528 subclass 194]  194           Subclass 194 indent level is 3 Two or more polycarboxylic acids or derivatives as reactants
[List of Patents for class 528 subclass 195]  195           Subclass 195 indent level is 3 Reactant is a nonphenolic compound having at least two hydroxyl groups or salts thereof
[List of Patents for class 528 subclass 196]  196           Subclass 196 indent level is 2 With reactant having halo-C(=O)-halo, halo-C(=O)-O-, or -O-C(=O)-O- group
[List of Patents for class 528 subclass 198]  198           Subclass 198 indent level is 3 Polymerizing in the presence of a specified material other than a reactant and other than Group IA or Group IIA material as sole metal atom
[List of Patents for class 528 subclass 199]  199           Subclass 199 indent level is 4 Material is a nitrogen-containing compound
[List of Patents for class 528 subclass 200]  200           Subclass 200 indent level is 4 Material contains a metal atom
[List of Patents for class 528 subclass 201]  201           Subclass 201 indent level is 3 Fused- or bridged-ring-containing reactant other than solely as a polycarboxylic acid anhydride group
[List of Patents for class 528 subclass 202]  202           Subclass 202 indent level is 3 Reactant contains a halogen atom other than solely as halogen bonded to a carbonyl group
[List of Patents for class 528 subclass 203]  203           Subclass 203 indent level is 3 Reactant contains a nitrogen atom
[List of Patents for class 528 subclass 204]  204           Subclass 204 indent level is 3 Two or more phenolic reactants
[List of Patents for class 528 subclass 205]  205           Subclass 205 indent level is 2 Ethylenically unsaturated reactant
[List of Patents for class 528 subclass 206]  206           Subclass 206 indent level is 2 Phenolic reactant contains at least one carboxylic acid group or is derivative thereof
[List of Patents for class 528 subclass 207]  207           Subclass 207 indent level is 3 Polymerizing in the presence of a specified material other than a reactant and other than Group IA or Group IIA material as sole metal atom
[List of Patents for class 528 subclass 208]  208           Subclass 208 indent level is 3 Nitrogen-containing reactant
[List of Patents for class 528 subclass 209]  209           Subclass 209 indent level is 3 With nonphenolic compound having at least two hydroxyl groups or salts thereof as reactant
[List of Patents for class 528 subclass 210]  210           Subclass 210 indent level is 2 Phenolic reactant contains a nitrogen atom
[List of Patents for class 528 subclass 211]  211           Subclass 211 indent level is 2 With nitrogen-containing reactant
[List of Patents for class 528 subclass 212]  212           Subclass 212 indent level is 2 Phenolic reactant contains a single phenolic -OH group or a single inorganic phenolate thereof
[List of Patents for class 528 subclass 214]  214           Subclass 214 indent level is 3 Polymerizing in the presence of a specified material other than a reactant and other than Group IA or Group IIA material as sole metal atom
[List of Patents for class 528 subclass 215]  215           Subclass 215 indent level is 4 Material is a nitrogen-containing compound
[List of Patents for class 528 subclass 216]  216           Subclass 216 indent level is 5 Nitrogen-containing material is a heterocyclic compound containing at least one nitrogen atom as a ring member
[List of Patents for class 528 subclass 217]  217           Subclass 217 indent level is 4 Material contains a metal atom
[List of Patents for class 528 subclass 218]  218           Subclass 218 indent level is 3 Two or more phenolic reactants each of which contains a single -OH group or inorganic phenolate group, or with a compound containing a single ether oxygen atom bonded to two discrete aryl rings
[List of Patents for class 528 subclass 219]  219           Subclass 219 indent level is 2 Phenolic reactant contains two or more phenolic -OH groups, or two or more inorganic phenolate groups, or mixtures thereof
[List of Patents for class 528 subclass 220]  220           Subclass 220 indent level is 1 FROM KETONE OR KETENE REACTANT
[List of Patents for class 528 subclass 222]  222           Subclass 222 indent level is 2 Polymerizing in the presence of a specified material other than a reactant
[List of Patents for class 528 subclass 223]  223           Subclass 223 indent level is 3 Material contains a phosphorus or sulfur atom
[List of Patents for class 528 subclass 224]  224           Subclass 224 indent level is 3 Material contains a nitrogen-containing compound
[List of Patents for class 528 subclass 225]  225           Subclass 225 indent level is 3 Material contains a boron or polyvalent metal atom
[List of Patents for class 528 subclass 226]  226           Subclass 226 indent level is 2 With sulfur-containing reactant
[List of Patents for class 528 subclass 227]  227           Subclass 227 indent level is 2 With aldehyde or derivative thereof as reactant
[List of Patents for class 528 subclass 228]  228           Subclass 228 indent level is 2 With nitrogen-containing reactant
[List of Patents for class 528 subclass 229]  229           Subclass 229 indent level is 3 Nitrogen-containing reactant contains an amine group
[List of Patents for class 528 subclass 230]  230           Subclass 230 indent level is 1 FROM ALDEHYDE OR DERIVATIVE THEREOF AS REACTANT
[List of Patents for class 528 subclass 232]  232           Subclass 232 indent level is 2 Polymerizing in the presence of a specified material other than a reactant
[List of Patents for class 528 subclass 233]  233           Subclass 233 indent level is 3 Material contains a metal atom
[List of Patents for class 528 subclass 234]  234           Subclass 234 indent level is 4 Material contains a transition metal atom
[List of Patents for class 528 subclass 235]  235           Subclass 235 indent level is 5 Transition metal atom is a Group VIII metal atom
[List of Patents for class 528 subclass 236]  236           Subclass 236 indent level is 4 Material contains a heavy metal atom
[List of Patents for class 528 subclass 237]  237           Subclass 237 indent level is 5 Heavy metal is a Group IVA metal atom (Ge, Sn, Pb)
[List of Patents for class 528 subclass 238]  238           Subclass 238 indent level is 4 Material contains an aluminum atom
[List of Patents for class 528 subclass 239]  239           Subclass 239 indent level is 4 Material contains a Group IA metal atom (Li, Na, K, Rb, Cs, Fr)
[List of Patents for class 528 subclass 240]  240           Subclass 240 indent level is 3 Material contains a boron atom
[List of Patents for class 528 subclass 241]  241           Subclass 241 indent level is 4 Boron trihalide or organic complex thereof
[List of Patents for class 528 subclass 242]  242           Subclass 242 indent level is 3 Material contains a phosphorus or sulfur atom
[List of Patents for class 528 subclass 243]  243           Subclass 243 indent level is 3 Material contains nitrogen as part of a nitrogen-containing compound
[List of Patents for class 528 subclass 244]  244           Subclass 244 indent level is 2 Fluorine- or phosphorus-containing reactant
[List of Patents for class 528 subclass 245]  245           Subclass 245 indent level is 2 From glyoxal or compound having two or more -C(=O)-H groups per se
[List of Patents for class 528 subclass 245.3]  245.3           Subclass 245.3 indent level is 2 With a polycarboxylic acid reactant which is a dimer or trimer of an ethylenically unsaturated aliphatic monocarboxylic acid having at least ten carbon atoms; or adduct of said unsaturated monocarboxylic acid with an alpha, beta ethylenically unsaturated carboxylic acid or derivative
[List of Patents for class 528 subclass 245.5]  245.5           Subclass 245.5 indent level is 2 With a reactant which is a fatty acid glycerol ester, a fatty acid or salt derived from a naturally occurring glyceride, tall oil, or a fatty acid derived from tall oil
[List of Patents for class 528 subclass 246]  246           Subclass 246 indent level is 2 Ethylenically unsaturated reactant other than unsaturation solely in heterocyclic ring containing only oxygen as hetero atom
[List of Patents for class 528 subclass 247]  247           Subclass 247 indent level is 2 With hydrocarbon or halogenated hydrocarbon reactant
[List of Patents for class 528 subclass 248]  248           Subclass 248 indent level is 2 With heterocyclic reactant which is not an aldehyde or derivative
[List of Patents for class 528 subclass 249]  249           Subclass 249 indent level is 3 Nonaldehyde or nonaldehyde derivative heterocyclic compound contains an oxygen atom as a ring member of the heterocyclic compound
[List of Patents for class 528 subclass 250]  250           Subclass 250 indent level is 4 Heterocyclic compound contains a 1,2-epoxy ring
[List of Patents for class 528 subclass 251]  251           Subclass 251 indent level is 3 Nonaldehyde or nonaldehyde derivative heterocyclic compound contains a sulfur atom as a ring member of the heterocyclic compound
[List of Patents for class 528 subclass 252]  252           Subclass 252 indent level is 3 Nonaldehyde or nonaldehyde derivative heterocyclic compound contains only two nitrogen atoms as ring members of the heterocyclic compound
[List of Patents for class 528 subclass 253]  253           Subclass 253 indent level is 3 Nonaldehyde or nonaldehyde derivative heterocyclic compound contains two or more heterocyclic rings and includes shared hetero atoms in a fused or bridged ring system
[List of Patents for class 528 subclass 254]  254           Subclass 254 indent level is 3 Nonaldehyde or nonaldehyde derivative heterocyclic reactant contains a six membered ring having three nitrogen and three carbon atoms as ring members
[List of Patents for class 528 subclass 255]  255           Subclass 255 indent level is 4 Sulfur-containing heterocyclic compound having three nitrogen and three carbon atoms
[List of Patents for class 528 subclass 256]  256           Subclass 256 indent level is 4 With reactant containing >NC(=O)- or >N-C(=S)- group, e.g., urea, etc.
[List of Patents for class 528 subclass 257]  257           Subclass 257 indent level is 4 With reactant containing at least one noncyclic carbon atom bonded to at least three atoms of nitrogen, e.g., dicyanodiamide, etc.
[List of Patents for class 528 subclass 258]  258           Subclass 258 indent level is 4 Six-membered heterocycle is other than melamine per se or methylol derivative thereof
[List of Patents for class 528 subclass 259]  259           Subclass 259 indent level is 2 With >N-C(=X)-N< -containing reactant wherein X is a chalcogen atom
[List of Patents for class 528 subclass 260]  260           Subclass 260 indent level is 3 Two or more >N-C(=X)-N< -containing reactants
[List of Patents for class 528 subclass 261]  261           Subclass 261 indent level is 3 At least one reactant is a nonaldehyde or nonaldehyde derivative, non- >N C(=X)-N< -containing reactant
[List of Patents for class 528 subclass 262]  262           Subclass 262 indent level is 4 Nonaldehyde reactant, non->N-C(=X)-N< reactant contains a nitrogen atom
[List of Patents for class 528 subclass 263]  263           Subclass 263 indent level is 5 Non- >N-C(=X)-N< nitrogen reactant is an organic compound containing two or more amino groups
[List of Patents for class 528 subclass 264]  264           Subclass 264 indent level is 3 >N-C(=X)-N< reactant is other than urea or thiourea per se
[List of Patents for class 528 subclass 265]  265           Subclass 265 indent level is 2 Sulfur-containing reactant
[List of Patents for class 528 subclass 266]  266           Subclass 266 indent level is 2 With nonaldehyde or nonaldehyde derivative nitrogen-containing compound
[List of Patents for class 528 subclass 267]  267           Subclass 267 indent level is 3 Nitrogen-containing nonaldehyde or nonaldehyde derivative contains a nitrile group
[List of Patents for class 528 subclass 268]  268           Subclass 268 indent level is 3 Nitrogen-containing nonaldehyde or nonaldehyde derivative contains three or more nitrogen atoms bonded to the same carbon atom, e.g., dicyanodiamide, etc.
[List of Patents for class 528 subclass 269]  269           Subclass 269 indent level is 3 Nitrogen-containing nonaldehyde or nonaldehyde derivative contains a single organic amine group
[List of Patents for class 528 subclass 270]  270           Subclass 270 indent level is 2 From aldehyde or aldehyde derivative as sole reactant (includes copolymer of only aldehydes or aldehyde derivatives)
[List of Patents for class 528 subclass 271]  271           Subclass 271 indent level is 1 FROM CARBOXYLIC ACID OR DERIVATIVE THEREOF
[List of Patents for class 528 subclass 272]  272           Subclass 272 indent level is 2 From di- or higher ester of a polycarboxylic acid as sole reactant, or from a polycarboxylic acid or derivative with a compound containing two or more hydroxyl groups or salts thereof
[List of Patents for class 528 subclass 274]  274           Subclass 274 indent level is 3 Polymerizing in the presence of a specified material other than reactant
[List of Patents for class 528 subclass 275]  275           Subclass 275 indent level is 4 Material contains a metal atom
[List of Patents for class 528 subclass 276]  276           Subclass 276 indent level is 5 Metal atom in elemental form
[List of Patents for class 528 subclass 277]  277           Subclass 277 indent level is 5 Material contains a transition metal atom
[List of Patents for class 528 subclass 278]  278           Subclass 278 indent level is 6 Metal atom has atomic number of 57-71, or 89 and higher
[List of Patents for class 528 subclass 279]  279           Subclass 279 indent level is 6 Material contains a Group IVB metal atom (Ti, Zr, Hf)
[List of Patents for class 528 subclass 280]  280           Subclass 280 indent level is 6 Material contains a Group VIII metal atom (Fe, Co, Ni, Ru, Rh, Pd, Os, Ir, Pt)
[List of Patents for class 528 subclass 281]  281           Subclass 281 indent level is 5 Material contains a Group IIB metal atom (Zn, Cd, Hg)
[List of Patents for class 528 subclass 282]  282           Subclass 282 indent level is 5 Material contains a Group IIIA metal atom (Al, Ga, In, Tl)
[List of Patents for class 528 subclass 283]  283           Subclass 283 indent level is 5 Material contains a Group IVA metal atom (Ge, Sn, Pb)
[List of Patents for class 528 subclass 284]  284           Subclass 284 indent level is 6 Material contains a lead atom
[List of Patents for class 528 subclass 285]  285           Subclass 285 indent level is 5 Material contains a Group VA metal atom (As, Sb, Bi)
[List of Patents for class 528 subclass 286]  286           Subclass 286 indent level is 4 Material contains a phosphorus atom
[List of Patents for class 528 subclass 287]  287           Subclass 287 indent level is 3 Phosphorus-containing reactant
[List of Patents for class 528 subclass 288]  288           Subclass 288 indent level is 3 Nitrogen-containing reactant
[List of Patents for class 528 subclass 289]  289           Subclass 289 indent level is 4 Final product contains nitrogen atom as a member of a heterocyclic ring
[List of Patents for class 528 subclass 290]  290           Subclass 290 indent level is 4 Sulfur-containing reactant
[List of Patents for class 528 subclass 291]  291           Subclass 291 indent level is 4 Nitrogen-containing polyhydroxy compound or salt of a nitrogen-containing polyhydroxy compound
[List of Patents for class 528 subclass 292]  292           Subclass 292 indent level is 4 Nitrogen-containing polycarboxylic acid or nitrogen-containing polycarboxylic acid derivative
[List of Patents for class 528 subclass 293]  293           Subclass 293 indent level is 3 Sulfur-containing reactant
[List of Patents for class 528 subclass 294]  294           Subclass 294 indent level is 4 Sulfur-containing polyhydroxy compound or salt of a sulfur-containing polyhydroxy compound
[List of Patents for class 528 subclass 295]  295           Subclass 295 indent level is 4 Sulfur-containing aryl compound
[List of Patents for class 528 subclass 295.3]  295.3           Subclass 295.3 indent level is 3 Polycarboxylic acid reactant which is a dimer or trimer of an ethylenically unsaturated aliphatic monocarboxylic acid having at least ten carbon atoms; or adduct of said unsaturated monocarboxylic acid with an alpha, beta ethylenically unsaturated carboxylic acid or derivative
[List of Patents for class 528 subclass 295.5]  295.5           Subclass 295.5 indent level is 3 Reactant which is a fatty acid glycerol ester, a fatty acid or salt derived from a naturally occurring glyceride, tall oil, or a fatty acid derived from tall oil
[List of Patents for class 528 subclass 296]  296           Subclass 296 indent level is 3 Reactant contains three or more carboxylic acid groups or is derivative thereof
[List of Patents for class 528 subclass 297]  297           Subclass 297 indent level is 3 1,2-epoxy containing reactant
[List of Patents for class 528 subclass 298]  298           Subclass 298 indent level is 3 Fused- or bridged-ring-containing reactant other than solely as cyclic acid anhydride group
[List of Patents for class 528 subclass 299]  299           Subclass 299 indent level is 3 Halogen-containing reactant other than solely as halogen atom bonded to a carbonyl group
[List of Patents for class 528 subclass 300]  300           Subclass 300 indent level is 3 Polyhydroxy-containing compound or salt thereof having an ether-oxygen atom as reactant
[List of Patents for class 528 subclass 301]  301           Subclass 301 indent level is 4 Acyclic ether-oxygen compound
[List of Patents for class 528 subclass 302]  302           Subclass 302 indent level is 3 Two or more carboxylic acid or derivatives or mixtures thereof
[List of Patents for class 528 subclass 303]  303           Subclass 303 indent level is 4 Ethylenically unsaturated carboxylic acid or ethylenically unsaturated derivative
[List of Patents for class 528 subclass 304]  304           Subclass 304 indent level is 5 Aryl-containing carboxylic acid or derivative of an aryl-containing carboxylic acid
[List of Patents for class 528 subclass 305]  305           Subclass 305 indent level is 4 Each of the carboxylic acids or derivatives contains an aryl group
[List of Patents for class 528 subclass 306]  306           Subclass 306 indent level is 3 Ethylenically unsaturated carboxylic acid or derivative of an ethylenically unsaturated carboxylic acid
[List of Patents for class 528 subclass 307]  307           Subclass 307 indent level is 3 Cycloaliphatic ring-containing reactant (other than aryl)
[List of Patents for class 528 subclass 308]  308           Subclass 308 indent level is 3 Aryl-containing carboxylic acid or derivative of an aryl-containing dicarboxylic acid
[List of Patents for class 528 subclass 308.1]  308.1           Subclass 308.1 indent level is 4 Polyethylene Terephthalate per se
[List of Patents for class 528 subclass 308.2]  308.2           Subclass 308.2 indent level is 5 Physically after-treated solid polymer
[List of Patents for class 528 subclass 308.3]  308.3           Subclass 308.3 indent level is 5 Processes of preparing
[List of Patents for class 528 subclass 308.4]  308.4           Subclass 308.4 indent level is 6 In presence of hydrocarbon, steam or water
[List of Patents for class 528 subclass 308.5]  308.5           Subclass 308.5 indent level is 6 At least two claimed distinct temperature or pressure gradients
[List of Patents for class 528 subclass 308.6]  308.6           Subclass 308.6 indent level is 4 Contains terephthalic acid or substituted forms thereof
[List of Patents for class 528 subclass 308.7]  308.7           Subclass 308.7 indent level is 5 Derived from at least two reactants simultaneously containing a C-OH group
[List of Patents for class 528 subclass 308.8]  308.8           Subclass 308.8 indent level is 5 Processes of preparing
[List of Patents for class 528 subclass 309.1]  309.1           Subclass 309.1 indent level is 6 At least two claimed distinct temperature or pressure gradients
[List of Patents for class 528 subclass 310]  310           Subclass 310 indent level is 2 From imide- or lactam-containing compound, or from an amino-nitrogen containing carboxylic acid, or derivative of an amino-nitrogen-containing carboxylic acid
[List of Patents for class 528 subclass 312]  312           Subclass 312 indent level is 3 Polymerizing in the presence of a specified material other than reactant
[List of Patents for class 528 subclass 313]  313           Subclass 313 indent level is 4 Material contains a phosphorus or sulfur atom
[List of Patents for class 528 subclass 314]  314           Subclass 314 indent level is 4 Material contains a nitrogen atom as a ring member of a heterocyclic ring other than where nitrogen heterocycle is solely part of a lactam ring
[List of Patents for class 528 subclass 315]  315           Subclass 315 indent level is 4 Material is a nitrogen-containing compound other than a lactam
[List of Patents for class 528 subclass 316]  316           Subclass 316 indent level is 4 Material is a ketone, aldehyde, or derivative
[List of Patents for class 528 subclass 317]  317           Subclass 317 indent level is 4 Material is an alcohol, ether, or inorganic alcoholate
[List of Patents for class 528 subclass 318]  318           Subclass 318 indent level is 4 Material is a carboxylic acid, acyl halide thereof, ester thereof, or lactone thereof
[List of Patents for class 528 subclass 319]  319           Subclass 319 indent level is 4 Material contains a polyvalent metal atom
[List of Patents for class 528 subclass 320]  320           Subclass 320 indent level is 4 Material contains a silicon atom
[List of Patents for class 528 subclass 321]  321           Subclass 321 indent level is 3 Phosphorus- or sulfur-containing reactant
[List of Patents for class 528 subclass 322]  322           Subclass 322 indent level is 3 Imide-containing reactant
[List of Patents for class 528 subclass 323]  323           Subclass 323 indent level is 3 Lactam-containing reactant
[List of Patents for class 528 subclass 324]  324           Subclass 324 indent level is 4 With two or more reactants one of which is a carboxylic acid or derivative and one of which is an organic compound containing at least two amino nitrogen atoms
[List of Patents for class 528 subclass 325]  325           Subclass 325 indent level is 4 Two or more lactam reactant or with an amino-containing carboxylic acid or derivative of an amino-containing carboxylic acid
[List of Patents for class 528 subclass 326]  326           Subclass 326 indent level is 4 Lactam reactant contains 3-5 or 12 or more carbon atoms in the lactam ring
[List of Patents for class 528 subclass 327]  327           Subclass 327 indent level is 3 Heterocyclic reactant or a reactant which contains a nitrogen atom bonded directly to another nitrogen atom
[List of Patents for class 528 subclass 328]  328           Subclass 328 indent level is 3 From N-C-(C=O)-OH containing reactant or acid derivative thereof, e.g., alpha amino acid, etc.
[List of Patents for class 528 subclass 329.1]  329.1           Subclass 329.1 indent level is 3 With two or more reactants one of which is a carboxylic acid or derivative thereof which is devoid of an amine group and one reactant which is a polyamine which is devoid of a carboxylic acid group or carboxylic acid derivative group
[List of Patents for class 528 subclass 330]  330           Subclass 330 indent level is 3 Cycloaliphatic ring-containing reactant
[List of Patents for class 528 subclass 331]  331           Subclass 331 indent level is 3 Aryl-containing reactant
[List of Patents for class 528 subclass 332]  332           Subclass 332 indent level is 2 With organic amine, or from organic amine salt of a carboxylic acid
[List of Patents for class 528 subclass 335]  335           Subclass 335 indent level is 3 From dicarboxylic acid or derivative thereof and an organic amine, or from an organic amine salt of a dicarboxylic acid
[List of Patents for class 528 subclass 336]  336           Subclass 336 indent level is 4 Polymerizing in the presence of a specified material
[List of Patents for class 528 subclass 337]  337           Subclass 337 indent level is 4 Phosphorus- or sulfur-containing reactant
[List of Patents for class 528 subclass 338]  338           Subclass 338 indent level is 4 From at least two dicarboxylic acids or derivatives or mixtures thereof and at least two organic polyamines
[List of Patents for class 528 subclass 339]  339           Subclass 339 indent level is 4 From at least two dicarboxylic acids or derivatives or mixtures thereof
[List of Patents for class 528 subclass 339.3]  339.3           Subclass 339.3 indent level is 5 Polycarboxylic acid reactant which is a dimer or trimer of an ethylenically unsaturated aliphatic monocarboxylic acid having at least ten carbon atoms; or adduct of said unsaturated monocarboxylic acid with an alpha, beta ethylenically unsaturated carboxylic acid or derivative
[List of Patents for class 528 subclass 339.5]  339.5           Subclass 339.5 indent level is 5 Reactant which is a fatty acid glycerol ester, a fatty acid or salt derived from a naturally occurring glyceride, tall oil, or a fatty acid derived from tall oil
[List of Patents for class 528 subclass 340]  340           Subclass 340 indent level is 4 From at least two organic polyamines
[List of Patents for class 528 subclass 341]  341           Subclass 341 indent level is 4 Heterocyclic-containing reactant other than cyclic acid anhydride as sole hetero ring
[List of Patents for class 528 subclass 342]  342           Subclass 342 indent level is 4 From reactant containing at least three amino-nitrogen-containing groups or with a carboxylic acid containing at least three carboxylic acid groups or deivatives thereof
[List of Patents for class 528 subclass 343]  343           Subclass 343 indent level is 4 Carboxylic acid containing (C=O)-(C=O) or is a derivative thereof, e.g., oxalic acid, etc.
[List of Patents for class 528 subclass 344]  344           Subclass 344 indent level is 4 Bridged- or fused-ring-containing reactant other than as anhydride fused to a nonfused- or bridged-ring system
[List of Patents for class 528 subclass 345]  345           Subclass 345 indent level is 4 Ethylenically unsaturated reactant
[List of Patents for class 528 subclass 346]  346           Subclass 346 indent level is 4 Cycloaliphatic ring-containing reactant
[List of Patents for class 528 subclass 347]  347           Subclass 347 indent level is 4 Aryl ring-containing reactant
[List of Patents for class 528 subclass 348]  348           Subclass 348 indent level is 5 All reactants contain at least one aryl ring
[List of Patents for class 528 subclass 349]  349           Subclass 349 indent level is 4 Reactant contains three carbon atoms directly bonded to a single carbon atom
[List of Patents for class 528 subclass 350]  350           Subclass 350 indent level is 3 From carboxylic acid having three or more carboxylic acid groups or derivatives thereof, and an organic amine, or from an organic amine salt of a tri-or higher carboxylic acid
[List of Patents for class 528 subclass 351]  351           Subclass 351 indent level is 4 Polymerizing in the presence of a specified material other than a reactant
[List of Patents for class 528 subclass 352]  352           Subclass 352 indent level is 4 Phosphorus- or sulfur-containing reactant
[List of Patents for class 528 subclass 353]  353           Subclass 353 indent level is 4 Carboxylic acid contains at least four carboxylic acid groups or is a derivative of a carboxylic acid containing at least four carboxylic groups
[List of Patents for class 528 subclass 354]  354           Subclass 354 indent level is 2 From compound having -C-C(=O)-O-C- group as part of a heterocyclic ring, e.g., lactone, etc.
[List of Patents for class 528 subclass 355]  355           Subclass 355 indent level is 3 Polymerizing in the presence of a specified material other than a reactant
[List of Patents for class 528 subclass 356]  356           Subclass 356 indent level is 4 Material contains a phosphorus or sulfur atom
[List of Patents for class 528 subclass 357]  357           Subclass 357 indent level is 4 Material contains a metal atom
[List of Patents for class 528 subclass 358]  358           Subclass 358 indent level is 5 Material contains a Group IA (Li, Na, K, Rb, Cs, Fr) or Group IIA metal atom (Be, Mg, Ca, Sr, Ba, Ra)
[List of Patents for class 528 subclass 359]  359           Subclass 359 indent level is 3 Heterocyclic ring compound is a four-membered ring containing one oxygen and three carbon atoms -C-C(=O)-O-C-
[List of Patents for class 528 subclass 360]  360           Subclass 360 indent level is 2 From sulfur-containing carboxylic acid
[List of Patents for class 528 subclass 361]  361           Subclass 361 indent level is 2 From ether, metal alcoholate, or alcohol group-containing carboxylic acid; or from a derivative of a carboxylic acid which derivative contains an ether, metal alcoholate, or alcohol group
[List of Patents for class 528 subclass 362]  362           Subclass 362 indent level is 2 From organic nitrile group-containing compound
[List of Patents for class 528 subclass 363]  363           Subclass 363 indent level is 2 With nitrogen-containing reactant
[List of Patents for class 528 subclass 364]  364           Subclass 364 indent level is 2 With sulfur-containing reactant
[List of Patents for class 528 subclass 365]  365           Subclass 365 indent level is 2 With reactant containing at least one cyclic ether group
[List of Patents for class 528 subclass 366]  366           Subclass 366 indent level is 3 Contains a single 1,2-epoxy group
[List of Patents for class 528 subclass 367]  367           Subclass 367 indent level is 1 FROM REACTANT HAVING A NITROGEN ATOM DIRECTLY BONDED TO THE CARBON ATOM OF A CARBONYL GROUP, I.E., N-C(=O)-
[List of Patents for class 528 subclass 368]  368           Subclass 368 indent level is 2 Polymerizing in the presence of a specified material other than a reactant
[List of Patents for class 528 subclass 369]  369           Subclass 369 indent level is 2 N-C(=O)-OH containing reactant or ester, salt, anhydride, or acyl halide thereof
[List of Patents for class 528 subclass 370]  370           Subclass 370 indent level is 1 FROM REACTANT HAVING A HALOGEN ATOM OR OXYGEN SINGLE BONDED TO A CARBONYL GROUP, E.G., HALO-C(=O)-, -O-C(=O)-O, ETC.
[List of Patents for class 528 subclass 371]  371           Subclass 371 indent level is 2 Polymerizing in the presence of a specified material other than a reactant
[List of Patents for class 528 subclass 372]  372           Subclass 372 indent level is 2 Reactant contains a halogen atom directly bonded to a carbon atom of a carbonyl group, i.e., halo-C(=O)-
[List of Patents for class 528 subclass 373]  373           Subclass 373 indent level is 1 FROM SULFUR-CONTAINING REACTANT
[List of Patents for class 528 subclass 374]  374           Subclass 374 indent level is 2 From mercaptan or mercaptide-containing reactant
[List of Patents for class 528 subclass 375]  375           Subclass 375 indent level is 3 Two or more mercaptan or mercaptide reactants, or mixture thereof, or with additional reactant-containing sulfur
[List of Patents for class 528 subclass 376]  376           Subclass 376 indent level is 3 With ethylenically unsaturated reactant
[List of Patents for class 528 subclass 377]  377           Subclass 377 indent level is 2 From heterocyclic compound containing a sulfur atom as a ring member
[List of Patents for class 528 subclass 378]  378           Subclass 378 indent level is 3 Polymerizing in the presence of a specified material other than a reactant
[List of Patents for class 528 subclass 379]  379           Subclass 379 indent level is 4 Material contains a Group IA (Li, Na, K, Rb, Cs, Fr) or Group IIA metal atom (Be, Mg, Ca, Sr, Ba, Ra)
[List of Patents for class 528 subclass 380]  380           Subclass 380 indent level is 3 Heterocyclic reactant contains a ring composed solely of carbon atoms and a single sulfur atom
[List of Patents for class 528 subclass 381]  381           Subclass 381 indent level is 2 From inorganic sulfur-containing reactant
[List of Patents for class 528 subclass 382]  382           Subclass 382 indent level is 3 Sulfur dioxide is a reactant
[List of Patents for class 528 subclass 383]  383           Subclass 383 indent level is 4 Polymerizing in the presence of a specified material other than a reactant
[List of Patents for class 528 subclass 384]  384           Subclass 384 indent level is 5 Material contains a metal atom
[List of Patents for class 528 subclass 385]  385           Subclass 385 indent level is 5 Material is free oxygen, peroxide, air, or ozone
[List of Patents for class 528 subclass 386]  386           Subclass 386 indent level is 4 With reactant containing only hydrogen and carbon atoms
[List of Patents for class 528 subclass 387]  387           Subclass 387 indent level is 3 Carbon disulfide or hydrogen sulfide is reactant
[List of Patents for class 528 subclass 388]  388           Subclass 388 indent level is 3 Inorganic sulfur reactant contains at least one metal atom or contains an ammonium ion
[List of Patents for class 528 subclass 389]  389           Subclass 389 indent level is 3 Elemental sulfur is reactant
[List of Patents for class 528 subclass 390]  390           Subclass 390 indent level is 2 From organic reactant containing a -C(=S)-group
[List of Patents for class 528 subclass 391]  391           Subclass 391 indent level is 2 From organic reactant containing a sulfur to oxygen bond, e.g., -S(=O), etc.
[List of Patents for class 528 subclass 392]  392           Subclass 392 indent level is 1 POLYMER OF AN ETHYLENICALLY UNSATURATED REACTANT WITH A SATURATED REACTANT
[List of Patents for class 528 subclass 393]  393           Subclass 393 indent level is 2 At least one reactant contains a three-membered heterocyclic ring having two carbon and one oxygen atoms, e.g., oxirane, etc.
[List of Patents for class 528 subclass 394]  394           Subclass 394 indent level is 1 FROM BORON-CONTAINING REACTANT
[List of Patents for class 528 subclass 395]  395           Subclass 395 indent level is 1 FROM ALUMINUM- OR HEAVY METAL-CONTAINING REACTANT
[List of Patents for class 528 subclass 396]  396           Subclass 396 indent level is 1 FROM HYDROCARBON REACTANT
[List of Patents for class 528 subclass 397]  397           Subclass 397 indent level is 1 FROM HALOGENATED HYDROCARBON REACTANT
[List of Patents for class 528 subclass 398]  398           Subclass 398 indent level is 1 FROM PHOSPHORUS-CONTAINING REACTANT
[List of Patents for class 528 subclass 399]  399           Subclass 399 indent level is 2 Phosphorus reactant contains a nitrogen atom
[List of Patents for class 528 subclass 400]  400           Subclass 400 indent level is 2 With alcohol or alcoholate reactant
[List of Patents for class 528 subclass 401]  401           Subclass 401 indent level is 1 FROM FLUORINE-CONTAINING REACTANT
[List of Patents for class 528 subclass 402]  402           Subclass 402 indent level is 2 Fluorine reactant contains a heterocyclic ring having a -C-O-C- group as part of the hetero ring atoms
[List of Patents for class 528 subclass 403]  403           Subclass 403 indent level is 1 FROM HETEROCYCLIC REACTANT CONTAINING AS RING ATOMS OXYGEN, SELENIUM OR TELLURIUM, E.G., EPOXY, ETC.
[List of Patents for class 528 subclass 405]  405           Subclass 405 indent level is 2 With reactant which is devoid of a heterocyclic ring containing oxygen, selenium or tellurium atoms as ring members
[List of Patents for class 528 subclass 406]  406           Subclass 406 indent level is 3 Heterocyclic reactant contains at least two heterocyclic rings having oxygen, selenium or tellurium as ring members
[List of Patents for class 528 subclass 407]  407           Subclass 407 indent level is 4 Reactant which is devoid of a heterocyclic ring containing oxygen, selenium or tellurium as ring atoms, contains at least one nitrogen atom
[List of Patents for class 528 subclass 408]  408           Subclass 408 indent level is 2 Polymerizing in the presence of a specified material other than a reactant
[List of Patents for class 528 subclass 409]  409           Subclass 409 indent level is 3 Material contains a metal atom
[List of Patents for class 528 subclass 410]  410           Subclass 410 indent level is 4 Material contains a transition metal atom
[List of Patents for class 528 subclass 411]  411           Subclass 411 indent level is 5 Material contains a Group IVB metal atom (Ti, Zr, Hf)
[List of Patents for class 528 subclass 412]  412           Subclass 412 indent level is 5 Material contains a Group VIII metal atom (Fe, Co, Ni, Pd, Ru, Os, Ir, Rh, Pt)
[List of Patents for class 528 subclass 413]  413           Subclass 413 indent level is 4 Material contains a Group IIA metal atom (Be, Mg, Ca, Sr, Ba, Ra)
[List of Patents for class 528 subclass 414]  414           Subclass 414 indent level is 4 Material contains a Group IIB metal atom (Zn, Cd, Hg)
[List of Patents for class 528 subclass 415]  415           Subclass 415 indent level is 5 Material contains at least two diverse metal atoms either in the same compound or in different compounds
[List of Patents for class 528 subclass 416]  416           Subclass 416 indent level is 4 Material contains a Group IIIA metal atom (Al, Ga, In, Tl)
[List of Patents for class 528 subclass 417]  417           Subclass 417 indent level is 2 Reactant contains a single hetero-atom in a ring and at least three carbon atoms, e.g., oxetane, etc.
[List of Patents for class 528 subclass 418]  418           Subclass 418 indent level is 2 Reactant contains two or more rings each of said rings having a single oxygen and two carbon atoms
[List of Patents for class 528 subclass 419]  419           Subclass 419 indent level is 2 Two or more heterocyclic reactants containing rings of one oxygen and two carbon atoms
[List of Patents for class 528 subclass 420]  420           Subclass 420 indent level is 2 Reactant has a three-membered ring of oxygen and two carbon and contains a nitrogen atom
[List of Patents for class 528 subclass 421]  421           Subclass 421 indent level is 2 Reactant has a three-membered ring containing oxygen and two carbon atoms, i.e., 1,2-epoxy
[List of Patents for class 528 subclass 422]  422           Subclass 422 indent level is 1 NITROGEN-CONTAINING REACTANT
[List of Patents for class 528 subclass 423]  423           Subclass 423 indent level is 2 Reactant contains nitrogen as a ring member of a heterocyclic ring
[List of Patents for class 528 subclass 424]  424           Subclass 424 indent level is 3 Heterocyclic nitrogen-containing ring contains a single atom of nitrogen and two atoms of carbon as ring members
[List of Patents for class 528 subclass 425]  425           Subclass 425 indent level is 1 FROM ORGANIC OXYGEN-CONTAINING REACTANT
[List of Patents for class 528 subclass 480]  480           Subclass 480 indent level is 1 TREATING POLYMER CONTAINING MATERIAL OR TREATING A SOLID POLYMER OR A RESINIFIABLE INTERMEDIATE CONDENSATION PRODUCT
[List of Patents for class 528 subclass 481]  481           Subclass 481 indent level is 2 Treating at O Deg C (32 Deg F) or below, or at 200 Deg C (392 Deg F) or above
[List of Patents for class 528 subclass 482]  482           Subclass 482 indent level is 2 Contacting with ion exchange material or solid sorbent
[List of Patents for class 528 subclass 483]  483           Subclass 483 indent level is 2 Contacting with exteriorly produced specified gaseous agent other than drying, blanket, or carrier gas
[List of Patents for class 528 subclass 484]  484           Subclass 484 indent level is 2 Preventing or removing reactor or processing equipment buildup
[List of Patents for class 528 subclass 485]  485           Subclass 485 indent level is 2 Contacting with aluminum or heavy metal material
[List of Patents for class 528 subclass 486]  486           Subclass 486 indent level is 2 Contacting with carboxylic acid, salt, or anhydride thereof
[List of Patents for class 528 subclass 487]  487           Subclass 487 indent level is 2 Contacting with sulfur or phosphorus-containing material
[List of Patents for class 528 subclass 488]  488           Subclass 488 indent level is 2 Contacting with alkali (Li, Na, K, Rb, Cs, Fr) or alkaline earth (Be, Mg, Ca, Sr, Ba) metal or compound thereof
[List of Patents for class 528 subclass 489]  489           Subclass 489 indent level is 3 Oxide or hydroxide
[List of Patents for class 528 subclass 490]  490           Subclass 490 indent level is 2 Contacting with specified element or with specified inorganic compound other than water, elemental nitrogen, air and the inert gases (Group VIII A)
[List of Patents for class 528 subclass 491]  491           Subclass 491 indent level is 2 Contacting with organic material
[List of Patents for class 528 subclass 492]  492           Subclass 492 indent level is 3 Nitrogen containing
[List of Patents for class 528 subclass 493]  493           Subclass 493 indent level is 3 Aldehyde or ketone
[List of Patents for class 528 subclass 494]  494           Subclass 494 indent level is 3 Ether
[List of Patents for class 528 subclass 495]  495           Subclass 495 indent level is 3 Alcohol
[List of Patents for class 528 subclass 496]  496           Subclass 496 indent level is 4 Contains one to four carbon atoms
[List of Patents for class 528 subclass 497]  497           Subclass 497 indent level is 3 Hydrocarbon
[List of Patents for class 528 subclass 498]  498           Subclass 498 indent level is 4 Acyclic
[List of Patents for class 528 subclass 499]  499           Subclass 499 indent level is 2 Contacting with water
[List of Patents for class 528 subclass 500]  500           Subclass 500 indent level is 3 Steam stripping or steam distilling
[List of Patents for class 528 subclass 501]  501           Subclass 501 indent level is 2 With distilling or pressured reduction step to remove material, e.g., flashing, autorefrigeration, etc.
[List of Patents for class 528 subclass 502R]  502R           Subclass 502R indent level is 2 Physical treatment
[List of Patents for class 528 subclass 502A]  502A           Subclass 502A indent level is 3 Filtration
[List of Patents for class 528 subclass 502B]  502B           Subclass 502B indent level is 3 Stretching to alter polymer properties by elongation
[List of Patents for class 528 subclass 502C]  502C           Subclass 502C indent level is 3 Compression or pressure treatment
[List of Patents for class 528 subclass 502D]  502D           Subclass 502D indent level is 3 Centrifuge separation
[List of Patents for class 528 subclass 502E]  502E           Subclass 502E indent level is 3 Spray drying or atomization
[List of Patents for class 528 subclass 502F]  502F           Subclass 502F indent level is 3 Shearing to change polymer particle size or to change polymer properties
[List of Patents for class 528 subclass 503]  503           Subclass 503 indent level is 2 Temperature maintaining, heating or cooling
 
CROSS-REFERENCE ART COLLECTIONS
 
[List of Patents for class 528 subclass 901]  901           ROOM TEMPERATURE CURABLE SILICON-CONTAINING POLYMER
[List of Patents for class 528 subclass 902]  902           PARTICULATE MATERIAL PREPARED FROM AN ISOCYANATE
[List of Patents for class 528 subclass 903]  903           POLYMERIZING OR PROCESSING AN ISOCYANATE UNDER SUBSTANTIALLY ANHYDROUS CONDITIONS
[List of Patents for class 528 subclass 904]  904           ISOCYANATE POLYMER HAVING STATED HYDROPHILIC OR HYDROPHOBIC PROPERTY
[List of Patents for class 528 subclass 905]  905           POLYMER PREPARED FROM ISOCYANATE REACTANT HAS ADHESIVE PROPERTY
[List of Patents for class 528 subclass 906]  906           FIBER OR ELASTOMER PREPARED FROM AN ISOCYANATE REACTANT
SUBCLASS 950 WILL BE THE GENERIC LOCATION FOR THE 520 SERIES THAT PERTAINS TO MORE THAN ONE OF THE INDIVIDUAL SERIES OTHER THAN THOSE CONCERNED WITH COMPOSITIONS, E.G., 523, 524, ETC.
[List of Patents for class 528 subclass 950]  950           POLYMERS USEFUL FOR REPLACING HARD ANIMAL TISSUES, E.G., DENTURES, BONES, ETC.
[List of Patents for class 528 subclass 930]  930           GUAYULE RUBBER
[List of Patents for class 528 subclass 931]  931           PHYSICAL TREATMENT OF NATURAL RUBBER OR NATURAL RUBBER CONTAINING MATERIAL OR CHEMICAL TREATMENT OF NON-RUBBER PORTION THEREOF, E.G., EXTRACTION OF RUBBER FROM MILK WEED, ETC.
[List of Patents for class 528 subclass 932]  932           Subclass 932 indent level is 1 Protein removal or conversion
[List of Patents for class 528 subclass 933]  933           Subclass 933 indent level is 1 Resin removal or conversion
[List of Patents for class 528 subclass 934]  934           Subclass 934 indent level is 1 Latex
[List of Patents for class 528 subclass 935]  935           Subclass 935 indent level is 2 Preserving or stabilizing
[List of Patents for class 528 subclass 936]  936           Subclass 936 indent level is 2 Coagulating
[List of Patents for class 528 subclass 937]  937           Subclass 937 indent level is 2 Concentrating, e.g., creaming, etc.
 
FOREIGN ART COLLECTIONS
 
   FOR000          CLASS-RELATED FOREIGN DOCUMENTS

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